Inventor · disambiguated record
Hiroyoshi Tanabe
Also filed as: TANABE HIROYOSHI
15 granted patents·5 pending applications·384 citations·filing 1989–2024
93Inventor score
Top patents by PatentIndex Score
20 records- 0194US5559583AExposure system and illuminating apparatus used therein and method for exposing a resist film on a waferNEC CORP·Filed 1995·Granted Sep 24, 1996·129 cites·13 claims
- 0293US11698580B2Reflective mask blank for EUV lithographyAGC INC·Filed 2021·Granted Jul 11, 2023·2 cites·17 claims
- 0391US5631110AProcess of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layerNEC CORP·Filed 1995·Granted May 20, 1997·111 cites·11 claims
- 0485US11281088B2Reflective mask blank for EUV exposure, and reflective maskAGC INC·Filed 2018·Granted Mar 22, 2022·2 cites·12 claims
- 0585US5002647AProcess for preparation of thick films by electrophoresisMITSUBISHI METAL CORP·Filed 1989·Granted Mar 26, 1991·36 cites·5 claims
- 0681US12216398B2Reflective mask blank and reflective maskAGC INC·Filed 2024·Granted Feb 4, 2025·0 cites·9 claims
- 0780US12038685B2Reflective mask blank for EUV lithographyAGC INC·Filed 2023·Granted Jul 16, 2024·0 cites·18 claims
- 0879US5476736AProjection exposure method and system used thereforNEC CORP·Filed 1994·Granted Dec 19, 1995·35 cites·9 claims
- 0977US10890842B2Reflective mask blank, reflective mask, and process for producing reflective mask blankAGC INC·Filed 2018·Granted Jan 12, 2021·1 cites·19 claims
- 1073US11835852B2Reflective mask blank for EUV exposure, and reflective maskAGC INC·Filed 2022·Granted Dec 5, 2023·0 cites·8 claims
- 1172US11914283B2Reflective mask blank and reflective maskAGC INC·Filed 2022·Granted Feb 27, 2024·0 cites·9 claims
- 1272US6150059APhotomask and method of exposure using sameNEC CORP·Filed 1998·Granted Nov 21, 2000·32 cites·16 claims
- 1364US5945237AHalftone phase-shift mask and halftone phase-shift mask defect correction methodNEC CORP·Filed 1997·Granted Aug 31, 1999·23 cites·23 claims
- 1462US2023185181A1Reflection-type mask, reflection-type mask blank, and method for manufacturing reflection-type maskAGC INC·Filed 2023·Application pending·0 cites
- 1558US2022299862A1Reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing mask blank and maskAGC INC·Filed 2022·Application pending·0 cites
- 1654US2021349387A1Reflective mask blank, reflective mask, and process for producing reflective mask blankAGC INC·Filed 2021·Application pending·0 cites
- 1751US2022187699A1Reflective mask blank for euvl, reflective mask for euvl, and method of manufacturing reflective mask for euvlAGC INC·Filed 2021·Application pending·0 cites
- 1847US5275894APhase shifting maskNEC CORP·Filed 1991·Granted Jan 4, 1994·8 cites·6 claims
- 1945US2019384156A1Reflective mask blank, reflective mask, and method of manufacturing reflective mask blankAGC INC·Filed 2019·Application pending·0 cites
- 2040US5434647AProjector for exposing photosensitive substrateNEC CORP·Filed 1994·Granted Jul 18, 1995·5 cites·7 claims
Join the waitlist — get patent alerts
Get an alert when Hiroyoshi Tanabe files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →