Inventor · disambiguated record
Hikaru Tokunaga
Also filed as: TOKUNAGA HIKARU
17 granted patents·19 pending applications·8 citations·filing 2016–2025
87Inventor score
Top patents by PatentIndex Score
36 records- 0197US11720024B2Resist underlayer film-forming composition containing indolocarbazole novolak resinNISSAN CHEMICAL IND LTD·Filed 2022·Granted Aug 8, 2023·4 cites·8 claims
- 0280US11681223B2Photocurable composition and method for producing semiconductor deviceNISSAN CHEMICAL CORP·Filed 2017·Granted Jun 20, 2023·2 cites·10 claims
- 0379US12242196B2Resist underlayer film-forming composition containing indolocarbazole novolak resinNISSAN CHEMICAL IND LTD·Filed 2023·Granted Mar 4, 2025·0 cites·4 claims
- 0474US11112696B2Protective film-forming compositionNISSAN CHEMICAL CORP·Filed 2017·Granted Sep 7, 2021·2 cites·10 claims
- 0573US2023112897A1Composition for forming photocurable silicon-containing coating filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 0672US2024006183A1Resist underlayer film-forming composition containing amide solventNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 0771US12147158B2Photocurable composition and method for producing semiconductor deviceNISSAN CHEMICAL CORP·Filed 2023·Granted Nov 19, 2024·0 cites·12 claims
- 0867US2021054231A1Composition for forming photocurable silicon-containing coating filmNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 0960US2025004367A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1059US2025231489A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2025·Application pending·0 cites
- 1154US12386262B2Resist underlayer film-forming composition using carbon-oxygen double bondNISSAN CHEMICAL CORP·Filed 2019·Granted Aug 12, 2025·0 cites·24 claims
- 1254US12044969B2Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Granted Jul 23, 2024·0 cites·11 claims
- 1352US11798810B2Resist underlayer film-forming composition containing amide solventNISSAN CHEMICAL CORP·Filed 2018·Granted Oct 24, 2023·0 cites·12 claims
- 1452US2018356732A1Resist underlayer film-forming composition containing indolocarbazole novolak resinNISSAN CHEMICAL IND LTD·Filed 2016·Application pending·0 cites
- 1551US2024302744A1Composition for forming silicon-containing underlayer film for induced self-organizationNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1651US2024004296A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 1749US12360452B2Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Granted Jul 15, 2025·0 cites·13 claims
- 1849US2023259031A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 1949US2023203299A1Resist underlayer film- forming composition using diarylmethane derivativeNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2049US2025085634A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2149US2023359123A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2248US2025376549A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 2348US2023161246A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2447US12072630B2Resist underlayer film-forming composition including cyclic carbonyl compoundNISSAN CHEMICAL CORP·Filed 2019·Granted Aug 27, 2024·0 cites·13 claims
- 2547US2023060585A1Resist underlying film-forming composition for nanoimprintingNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 2645US2025189896A1Resist underlayer film formation compositionNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 2744US2022269176A1Composition for coating substrate with level difference, said composition containing compound having curable functional groupNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 2842US10871712B2Stepped substrate-coating composition containing polyether resin having photocrosslinkable groupNISSAN CHEMICAL CORP·Filed 2018·Granted Dec 22, 2020·0 cites·16 claims
- 2941US11674051B2Stepped substrate coating composition containing compound having curable functional groupNISSAN CHEMICAL CORP·Filed 2018·Granted Jun 13, 2023·0 cites·27 claims
- 3041US11506980B2Resist underlayer film forming composition using a fluorene compoundNISSAN CHEMICAL CORP·Filed 2018·Granted Nov 22, 2022·0 cites·12 claims
- 3141US11385546B2Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atomsNISSAN CHEMICAL CORP·Filed 2018·Granted Jul 12, 2022·0 cites·21 claims
- 3241US10894887B2Composition for forming film protecting against aqueous hydrogen peroxide solutionNISSAN CHEMICAL CORP·Filed 2018·Granted Jan 19, 2021·0 cites·7 claims
- 3340US11454889B2Crosslinkable compound-containing photocurable stepped substrate-coating compositionNISSAN CHEMICAL CORP·Filed 2018·Granted Sep 27, 2022·0 cites·25 claims
- 3440US2022155686A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 3539US12449732B2Composition for forming resist underlayer film with improved film densityNISSAN CHEMICAL CORP·Filed 2017·Granted Oct 21, 2025·0 cites·4 claims
- 3637US2019079397A1Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atomsNISSAN CHEMICAL CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →