Inventor · disambiguated record
Hok-Kin Choi
Also filed as: CHOI HOK-KIN
9 granted patents·3 pending applications·35 citations·filing 2002–2007
84Inventor score
Top patents by PatentIndex Score
12 records- 0176US7087104B2Preparation of electroless deposition solutionsINTEL CORP·Filed 2003·Granted Aug 8, 2006·16 cites·23 claims
- 0266US7622305B2Multiple acid solution characterizationINTEL CORP·Filed 2006·Granted Nov 24, 2009·2 cites·23 claims
- 0366US6864192B1Langmuir-blodgett chemically amplified photoresistINTEL CORP·Filed 2003·Granted Mar 8, 2005·11 cites·15 claims
- 0462US7412872B2Process for screening outgas emissions in semiconductor processingINTEL CORP·Filed 2005·Granted Aug 19, 2008·2 cites·19 claims
- 0550US2008241401A1Method of monitoring electroless plating chemistryCHOI HOK-KIN·Filed 2007·Application pending·0 cites
- 0648US7375030B2Method to assay sacrificial light absorbing materials and spin on glass materials for chemical origin of defectivityINTEL CORP·Filed 2006·Granted May 20, 2008·0 cites·15 claims
- 0745US7391501B2Immersion liquids with siloxane polymer for immersion lithographyINTEL CORP·Filed 2004·Granted Jun 24, 2008·2 cites·13 claims
- 0844US7867687B2Methods and compositions for reducing line wide roughnessINTEL CORP·Filed 2003·Granted Jan 11, 2011·1 cites·21 claims
- 0944US7316893B2Modular containment cell arrangementsINTEL CORP·Filed 2002·Granted Jan 8, 2008·1 cites·27 claims
- 1041US2008179184A1Analyzing samples having diverse analytes in presence of salt using chromatography and evaporative light scattering detectionCHOI HOK-KIN·Filed 2007·Application pending·0 cites
- 1140US7089785B2Method to assay sacrificial light absorbing materials and spin on glass materials for chemical origin of defectivityINTEL CORP·Filed 2003·Granted Aug 15, 2006·0 cites·17 claims
- 1231US2004266014A1Removing contaminations due to polymer aggregation in photoresistFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →