Inventor · disambiguated record
Horia M. Faur
Also filed as: FAUR HORIA M
10 granted patents·1 pending application·109 citations·filing 1999–2016
87Inventor score
Files withSPECIAL MATERIALS RES AND TECH4SPECMAT INC3FAUR MARIA2FAUR HORIA M1SPECIAL MATERIALS RESEARCH AND TECH INC SPECMAT1
Top patents by PatentIndex Score
11 records- 0185US6613697B1Low metallic impurity SiO based thin film dielectrics on semiconductor substrates using a room temperature wet chemical growth process, method and applications thereofSPECIAL MATERIALS RES AND TECH·Filed 2001·Granted Sep 2, 2003·44 cites·29 claims
- 0284US9068112B2Compositions to facilitate room temperature growth of an oxide layer on a substrateFAUR MARIA·Filed 2011·Granted Jun 30, 2015·6 cites·4 claims
- 0379US10526538B2Methods, process and fabrication technology for high-efficiency low-cost crystalline silicon solar cellsFAUR MARIA·Filed 2014·Granted Jan 7, 2020·3 cites·17 claims
- 0472US6593077B2Method of making thin films dielectrics using a process for room temperature wet chemical growth of SiO based oxides on a substrateSPECIAL MATERIALS RES AND TECH·Filed 2001·Granted Jul 15, 2003·17 cites·56 claims
- 0567US6080683ARoom temperature wet chemical growth process of SiO based oxides on siliconSPECIAL MATERIALS RES AND TECH·Filed 1999·Granted Jun 27, 2000·36 cites·21 claims
- 0663US10217893B2Methods, apparatus, and systems for passivation of solar cells and other semiconductor devicesSPECIAL MATERIALS RESEARCH AND TECH INC SPECMAT·Filed 2014·Granted Feb 26, 2019·2 cites·29 claims
- 0753US2016122554A1Chemical compositions for semiconductor manufacturing processes and/or methods, apparatus made with same, and semiconductor structures with reduced potential induced degradationSPECMAT INC·Filed 2014·Application pending·0 cites
- 0831US10529872B2Silicon-containing semiconductor structures, methods of making the same and devices including the sameSPECMAT INC·Filed 2016·Granted Jan 7, 2020·0 cites·7 claims
- 0929US10619097B2Low-[HF] room temperature wet chemical growth (RTWCG) chemical formulationFAUR HORIA M·Filed 2015·Granted Apr 14, 2020·0 cites·14 claims
- 1028US6409889B1Method for the removal and recovery of inorganic pollutants from waste aqueous solutions and waste primary air sourcesSPECIAL MATERIALS RES AND TECH·Filed 1999·Granted Jun 25, 2002·1 cites·10 claims
- 1127US10622495B2Method, process and fabrication technology for oxide layersSPECMAT INC·Filed 2015·Granted Apr 14, 2020·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →