Inventor · disambiguated record
Ho-Chul Kim
Also filed as: KIM HO-CHUL
9 granted patents·6 pending applications·68 citations·filing 2003–2013
86Inventor score
Top patents by PatentIndex Score
15 records- 0191US7642019B2Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions thereforeSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jan 5, 2010·21 cites·15 claims
- 0290US7855037B2Photomask having a test pattern that includes separate features for different printed critical dimensions to correlate magnitude and direction of defocusSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Dec 21, 2010·17 cites·7 claims
- 0370US7903530B2Optical system for spatially controlling light polarization and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 8, 2011·3 cites·18 claims
- 0470US6900887B2Method and system for measuring stray lightSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 31, 2005·15 cites·22 claims
- 0562US8594409B2Automation method for computerized tomography image analysis using automated calculation of evaluation index of degree of thoracic deformation based on automatic initialization, and record medium and apparatusKIM SUNG MIN·Filed 2012·Granted Nov 26, 2013·2 cites·19 claims
- 0661US7384711B2Stencil mask having main and auxiliary strut and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jun 10, 2008·5 cites·15 claims
- 0757US6913858B2Photomask for measuring lens aberration, method of manufacturing the same, and method of measuring lens aberrationSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jul 5, 2005·5 cites·41 claims
- 0854US7635547B2Stencil mask having main and auxiliary strut and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Dec 22, 2009·0 cites·36 claims
- 0953US2009180182A1Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1046US2006083996A1Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatusKIM HO-CHUL·Filed 2005·Application pending·0 cites
- 1140US2014264089A1Apparatus and method for generating extreme ultra violet radiationSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 1240US2006234137A1Photomask structures providing improved photolithographic process windows and methods of manufacturing sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1337US2006115746A1Focus monitoring masks having multiple phase shifter units and methods for fabricating the sameCHOI SUNG-WON·Filed 2005·Application pending·0 cites
- 1436US2010076352A1Apparatus using focused ultrasound wave by controlling electronic signals and using method thereofKOREA RES INST OF STANDARDS·Filed 2006·Application pending·0 cites
- 1533US8296082B2System for testing performance of array ultrasound transducerKIM YONG-TAE·Filed 2007·Granted Oct 23, 2012·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →