Inventor · disambiguated record
Homi E. Nariman
Also filed as: NARIMAN HOMI · NARIMAN HOMI E
14 granted patents·248 citations·filing 1998–2002
93Inventor score
Files withADVANCED MICRO DEVICES INC14
Top patents by PatentIndex Score
14 records- 0185US6157081AHigh-reliability damascene interconnect formation for semiconductor fabricationADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 5, 2000·83 cites·20 claims
- 0280US6742168B1Method and structure for calibrating scatterometry-based metrology tool used to measure dimensions of features on a semiconductor deviceADVANCED MICRO DEVICES INC·Filed 2002·Granted May 25, 2004·24 cites·32 claims
- 0378US6767835B1Method of making a shaped gate electrode structure, and device comprising sameADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 27, 2004·25 cites·54 claims
- 0478US6660543B1Method of measuring implant profiles using scatterometric techniques wherein dispersion coefficients are varied based upon depthADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 9, 2003·22 cites·52 claims
- 0569US6972853B1Methods of calibrating and controlling stepper exposure processes and tools, and system for accomplishing sameADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 6, 2005·12 cites·51 claims
- 0667US6933158B1Method of monitoring anneal processes using scatterometry, and system for performing sameADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 23, 2005·11 cites·84 claims
- 0767US6791697B1Scatterometry structure with embedded ring oscillator, and methods of using sameADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 14, 2004·11 cites·45 claims
- 0865US6927080B1Structures for analyzing electromigration, and methods of using sameADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 9, 2005·10 cites·65 claims
- 0964US6372668B2Method of forming silicon oxynitride filmsADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 16, 2002·9 cites·14 claims
- 1059US6881594B1Method of using scatterometry for analysis of electromigration, and structures for performing sameADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 19, 2005·2 cites·54 claims
- 1159US6146952ASemiconductor device having self-aligned asymmetric source/drain regions and method of fabrication thereofADVANCED MICRO DEVICES INC·Filed 1998·Granted Nov 14, 2000·18 cites·20 claims
- 1247US6265283B1Self-aligning silicon oxynitride stack for improved isolation structureADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 24, 2001·13 cites·31 claims
- 1340US6096643AMethod of fabricating a semiconductor device having polysilicon line with extended silicide layerADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 1, 2000·8 cites·11 claims
- 1430US6249032B1Semiconductor device having patterned metal layer over a polysilicon line and method of fabrication thereofADVANCED MICRO DEVICES INC·Filed 1998·Granted Jun 19, 2001·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →