Inventor · disambiguated record
Hsin-Chang Lee
Also filed as: LEE HSIN · LEE HSIN-CHANG
159 granted patents·64 pending applications·931 citations·filing 2005–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD190TAIWAN SEMICONDUCTOR MFG15LEE HSIN-CHANG5HSUEH WEN-JUNG2LIN YUN-YUE2
Top patents by PatentIndex Score
223 records- 0198US9869928B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 16, 2018·128 cites·20 claims
- 0298US8709682B2Mask and method for forming the maskCHEN CHIA-JEN·Filed 2012·Granted Apr 29, 2014·82 cites·20 claims
- 0398US8679707B2Method of fabricating a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Mar 25, 2014·86 cites·20 claims
- 0497US12153339B2Network type pellicle membrane and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 26, 2024·4 cites·20 claims
- 0597US12013632B2Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 0697US11860532B2Photomask including fiducial mark and method of making a semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·2 cites·20 claims
- 0797US11422466B2Photomask including fiducial mark and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 23, 2022·3 cites·20 claims
- 0897US8877409B2Reflective mask and method of making sameHSU PEI-CHENG·Filed 2012·Granted Nov 4, 2014·324 cites·20 claims
- 0996US11687006B2Method of manufacturing photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 27, 2023·2 cites·20 claims
- 1095US12181797B2Extreme ultraviolet mask with alloy based absorbersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 31, 2024·2 cites·20 claims
- 1195US12050399B2Pellicle assembly and method of making sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 30, 2024·2 cites·20 claims
- 1295US11385538B2Cleaning method for photo masks and apparatus thereforTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 12, 2022·3 cites·20 claims
- 1395US11294292B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·3 cites·20 claims
- 1495US11143952B2Pellicle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 12, 2021·5 cites·20 claims
- 1595US10001701B1Pellicle structures and methods of fabricating thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 19, 2018·7 cites·20 claims
- 1695US9360749B2Pellicle structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 7, 2016·10 cites·21 claims
- 1794US12085843B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·1 cites·20 claims
- 1894US12013646B2High throughput and high position accurate method for particle inspection of mask podsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 18, 2024·2 cites·20 claims
- 1994US10162258B2Pellicle fabrication methods and structures thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·8 cites·20 claims
- 2094US8765330B2Phase shift mask for extreme ultraviolet lithography and method of fabricating sameSHIH CHIA-TSUNG·Filed 2012·Granted Jul 1, 2014·85 cites·20 claims
- 2193US10534256B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 14, 2020·6 cites·19 claims
- 2293US9759997B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 12, 2017·7 cites·20 claims
- 2392US12032302B2Method and device for cleaning substratesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 9, 2024·2 cites·20 claims
- 2492US11614691B2High throughput and high position accurate method for particle inspection of mask podsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 28, 2023·2 cites·20 claims
- 2592US9244341B2Photomask and method for forming the sameTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jan 26, 2016·4 cites·20 claims
- 2692US8589828B2Reduce mask overlay error by removing film deposited on blank of maskLEE HSIN-CHANG·Filed 2012·Granted Nov 19, 2013·29 cites·20 claims
- 2791US11714350B2Method of fabricating and servicing a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 1, 2023·1 cites·20 claims
- 2891US11561464B2EUV masks to prevent carbon contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 24, 2023·1 cites·20 claims
- 2991US11086215B2Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 10, 2021·4 cites·20 claims
- 3091US10295899B2Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 21, 2019·4 cites·20 claims
- 3191US9213232B2Reflective mask and method of making sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·5 cites·20 claims
- 3291US7829248B2Pellicle stress reliefTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Nov 9, 2010·17 cites·20 claims
- 3390US12298673B2Method of manufacturing photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted May 13, 2025·0 cites·20 claims
- 3490US11294271B2Mask for extreme ultraviolet photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·2 cites·20 claims
- 3590US11294274B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·2 cites·19 claims
- 3690US11204545B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 21, 2021·2 cites·20 claims
- 3790US11042084B2Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 22, 2021·3 cites·20 claims
- 3890US2025370329A1Carbon-containing diffusion barrier layer for protection of cnt euv pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3989US12346027B2Methods of making a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 4089US11815804B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 14, 2023·1 cites·20 claims
- 4189US11789356B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 17, 2023·1 cites·20 claims
- 4289US11698592B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 11, 2023·1 cites·20 claims
- 4389US10670959B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·2 cites·17 claims
- 4488US12339579B2Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jun 24, 2025·0 cites·20 claims
- 4588US2025362584A1Lithography mask having high extinction coefficient absorber and related systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4688US2025355360A1Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4788US2025362580A1Extreme ultraviolet mask with capping layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4888US2025362588A1Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4987US12366797B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 22, 2025·0 cites·20 claims
- 5087US12339582B2Photomask including fiducial mark and method of making a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 24, 2025·0 cites·20 claims
Showing the top 50 of 223 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Hsin-Chang Lee files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →