Inventor · disambiguated record
Hsiang-Wei Liu
Also filed as: LIU HSIANG · LIU HSIANG-WEI
50 granted patents·11 pending applications·196 citations·filing 1996–2025
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD48LIU HSIANG-WEI4ADVANCED MICRO DEVICES INC2GLOBAL UNICHIP CORP2QUANTA COMP INC2
Top patents by PatentIndex Score
61 records- 0197US11729969B1Semiconductor device and method of operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 15, 2023·5 cites·20 claims
- 0297US10269715B2Split rail structures located in adjacent metal layersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 23, 2019·29 cites·20 claims
- 0397US10020261B2Split rail structures located in adjacent metal layersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 10, 2018·31 cites·20 claims
- 0493US10290580B2Hybrid copper structure for advance interconnect usageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 14, 2019·7 cites·20 claims
- 0591US10147609B2Semiconductor epitaxy bordering isolation structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 4, 2018·5 cites·20 claims
- 0691US9607881B2Insulator void aspect ratio tuning by selective depositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 28, 2017·13 cites·20 claims
- 0789US9837354B2Hybrid copper structure for advance interconnect usageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 5, 2017·7 cites·20 claims
- 0887US10930551B2Methods for fabricating a low-resistance interconnectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 23, 2021·3 cites·20 claims
- 0987US10522353B2Semiconductor epitaxy bordering isolation structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 31, 2019·3 cites·20 claims
- 1085US11302570B2Interconnect structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 12, 2022·4 cites·20 claims
- 1185US10957540B2Semiconductor epitaxy bordering isolation structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 23, 2021·2 cites·20 claims
- 1284US10957580B2Metal routing with flexible space formed using self-aligned spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 23, 2021·1 cites·20 claims
- 1382US10818597B2Hybrid copper structure for advance interconnect usageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 27, 2020·2 cites·20 claims
- 1482US10529617B2Metal routing with flexible space formed using self-aligned spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 7, 2020·2 cites·20 claims
- 1581US12278143B2Method of providing a workpiece including low resistance interconnect low-resistance interconnectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 15, 2025·0 cites·20 claims
- 1681US2025294731A1Novel metal fuse structure by via landingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1780US10534273B2Multi-metal fill with self-aligned patterning and dielectric with voidsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 14, 2020·2 cites·20 claims
- 1880US2024085803A1Multi-metal fill with self-aligned patterning and dielectric with voidsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1979US2024389312A1Metal fuse structure by via landingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2078US11860550B2Multi-metal fill with self-aligned patterning and dielectric with voidsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·0 cites·20 claims
- 2177US11901295B2Dielectric film for semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 13, 2024·0 cites·20 claims
- 2277US10734275B2Metal routing with flexible space formed using self-aligned spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 4, 2020·1 cites·20 claims
- 2376US12058852B2Semiconductor device and method of operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 6, 2024·0 cites·20 claims
- 2476US9583434B2Metal line structure and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 28, 2017·2 cites·20 claims
- 2576US2025329401A1Memory device, layout, and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2675US12051646B2Metal line structure and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 30, 2024·0 cites·20 claims
- 2775US9219494B2Dual mode analog to digital converterGLOBAL UNICHIP CORP·Filed 2014·Granted Dec 22, 2015·5 cites·18 claims
- 2875US5824457AUse of WEE (wafer edge exposure) to prevent polyimide contaminationTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Oct 20, 1998·45 cites·23 claims
- 2975US2024389311A1Multiple pattern metal fuse manufacturing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3074US11658032B2Semiconductor epitaxy bordering isolation structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 23, 2023·0 cites·20 claims
- 3173US11769695B2Semiconductor structure including low-resistance interconnect and integrated circuit device having the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 26, 2023·0 cites·20 claims
- 3272US12002709B2Interconnect structure and manufacturing method for the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 4, 2024·0 cites·20 claims
- 3372US6819556B2Server system and vibration-free extractable hard disc drive assembly thereofQUANTA COMP INC·Filed 2003·Granted Nov 16, 2004·8 cites·20 claims
- 3471US12324149B2Metal fuse structure by via landingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 3, 2025·0 cites·20 claims
- 3571US10658296B2Dielectric film for semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 19, 2020·1 cites·20 claims
- 3671US10276396B2Method for forming semiconductor device with damascene structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·1 cites·20 claims
- 3770US7307838B2Hard disc drive carrierQUANTA COMP INC·Filed 2005·Granted Dec 11, 2007·5 cites·12 claims
- 3869US11107725B2Interconnect structure and manufacturing method for the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 31, 2021·0 cites·19 claims
- 3968US12493731B2Multiple pattern metal fuse device, layout, and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 9, 2025·0 cites·20 claims
- 4068US9425089B2Conductive element structure and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 23, 2016·1 cites·20 claims
- 4166US11101216B2Metal line structure and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 4265US11422475B2Multi-metal fill with self-aligned patterning and dielectric with voidsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 23, 2022·0 cites·20 claims
- 4365US11296027B2Dielectric film for semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 5, 2022·0 cites·20 claims
- 4464US12380957B2Memory device, layout, and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 5, 2025·0 cites·20 claims
- 4562US10784151B2Interconnect structure and manufacturing method for the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 22, 2020·0 cites·20 claims
- 4662US10522469B2Split rail structures located in adjacent metal layersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 31, 2019·0 cites·20 claims
- 4761US11152306B2Dielectric film for semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 19, 2021·0 cites·19 claims
- 4860US2025210600A1System-on-chip gap fill method and structureADVANCED MICRO DEVICES INC·Filed 2023·Application pending·0 cites
- 4959US2025157973A1Systems and methods for reducing semiconductor device delaminationADVANCED MICRO DEVICES INC·Filed 2023·Application pending·0 cites
- 5058US10490500B2Metal line structure and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 26, 2019·0 cites·20 claims
Showing the top 50 of 61 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →