Inventor · disambiguated record
Hung-Wen Cho
Also filed as: CHO HUNG-WEN
9 granted patents·1 pending application·7 citations·filing 2016–2025
81Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD10
Top patents by PatentIndex Score
10 records- 0187US10366973B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 30, 2019·2 cites·20 claims
- 0287US2025362615A1Lithography system and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0386US10642158B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 5, 2020·2 cites·20 claims
- 0483US10871713B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 22, 2020·1 cites·20 claims
- 0580US11150561B2Method and apparatus for collecting information used in image-error compensationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 19, 2021·1 cites·20 claims
- 0672US11594528B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 28, 2023·0 cites·20 claims
- 0771US10712651B2Method and apparatus for collecting information used in image-error compensationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 14, 2020·1 cites·20 claims
- 0870US11024623B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 1, 2021·0 cites·20 claims
- 0964US10720419B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 21, 2020·0 cites·20 claims
- 1037US10276375B2Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 30, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →