Inventor · disambiguated record
Hua-Tai Lin
Also filed as: LIN HUA · LIN HUA-TAI
63 granted patents·14 pending applications·829 citations·filing 1997–2025
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD38TAIWAN SEMICONDUCTOR MFG21VANGUARD INT SEMICONDUCT CORP5KUO CHENG-CHENG2WANG HSIEN-CHENG2
Top patents by PatentIndex Score
77 records- 0198US8762900B2Method for proximity correctionSHIN JAW-JUNG·Filed 2012·Granted Jun 24, 2014·121 cites·13 claims
- 0297US10282504B2Method for improving circuit layout for manufacturabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 7, 2019·31 cites·20 claims
- 0397US9870443B2Method and apparatus for integrated circuit mask patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 16, 2018·26 cites·20 claims
- 0497US8507177B2Photoresist materials and photolithography processesWANG HSIEN-CHENG·Filed 2011·Granted Aug 13, 2013·34 cites·19 claims
- 0595US6077756AOverlay target pattern and algorithm for layer-to-layer overlay metrology for semiconductor processingVANGUARD INT SEMICONDUCT CORP·Filed 1998·Granted Jun 20, 2000·262 cites·21 claims
- 0693US6492073B1Removal of line end shortening in microlithography and mask set for removalTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 10, 2002·59 cites·20 claims
- 0790US11961738B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 16, 2024·2 cites·20 claims
- 0890US11392045B2Method for manufacturing semiconductor device and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 19, 2022·2 cites·20 claims
- 0990US8589830B2Method and apparatus for enhanced optical proximity correctionCHANG CHIA-CHENG·Filed 2012·Granted Nov 19, 2013·29 cites·20 claims
- 1089US9184101B2Method for removing semiconductor fins using alternating masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Nov 10, 2015·10 cites·20 claims
- 1186US10859924B2Method for manufacturing semiconductor device and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 8, 2020·4 cites·20 claims
- 1285US11804410B2Thin-film non-uniform stress evaluationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 31, 2023·2 cites·20 claims
- 1385US9418199B2Method and apparatus for extracting systematic defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 16, 2016·4 cites·20 claims
- 1482US8972909B1OPC method with higher degree of freedomTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Mar 3, 2015·4 cites·20 claims
- 1581US12362180B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 15, 2025·0 cites·20 claims
- 1681US10990744B2Method and apparatus for integrated circuit mask patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 27, 2021·1 cites·20 claims
- 1781US2025308893A1Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1879US9213233B2Photolithography scattering bar structure and methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 15, 2015·3 cites·20 claims
- 1979US2025323101A1Thin-film non-uniform stress evaluationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2078US12196687B2Method for inspecting pattern defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 14, 2025·1 cites·20 claims
- 2177US8984450B2Method and apparatus for extracting systematic defectsTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Mar 17, 2015·5 cites·20 claims
- 2277US6569760B1Method to prevent poison viaTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted May 27, 2003·20 cites·22 claims
- 2377US2025285877A1Feature patterning using pitch relaxation and directional end-pushing with ion bombardmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2476US9026956B1Method of lithographic process evaluationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 5, 2015·4 cites·20 claims
- 2575US9201022B2Extraction of systematic defectsHU JIA-RUI·Filed 2011·Granted Dec 1, 2015·6 cites·20 claims
- 2674US12315737B2Feature patterning using pitch relaxation and directional end-pushing with ion bombardmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 27, 2025·0 cites·20 claims
- 2774US7399709B1Complementary replacement of materialTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Jul 15, 2008·17 cites·43 claims
- 2873US12374588B2Method for evaluating non-uniform stressTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 29, 2025·0 cites·20 claims
- 2973US2025259843A1Dual critical dimension patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3072US11846881B2EUV photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 19, 2023·0 cites·20 claims
- 3171US11748549B2Method and apparatus for integrated circuit mask patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 5, 2023·0 cites·20 claims
- 3271US7939222B2Method and system for improving printing accuracy of a contact layoutTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 10, 2011·3 cites·10 claims
- 3371US2024389353A1Memory device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3470US9195134B2Method and apparatus for integrated circuit mask patterningTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 24, 2015·2 cites·17 claims
- 3570US6037276AMethod for improving patterning of a conductive layer in an integrated circuitVANGUARD INT SEMICONDUCT CORP·Filed 1997·Granted Mar 14, 2000·36 cites·12 claims
- 3670US5982044AAlignment pattern and algorithm for photolithographic alignment marks on semiconductor substratesVANGUARD INT SEMICONDUCT CORP·Filed 1998·Granted Nov 9, 1999·40 cites·24 claims
- 3769US11392745B2Method for improving circuit layout for manufacturabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 19, 2022·0 cites·20 claims
- 3868US8972912B1Structure for chip extensionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Mar 3, 2015·2 cites·20 claims
- 3967US12308233B2Dual critical dimension patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 20, 2025·0 cites·20 claims
- 4067US6133613AAnti-reflection oxynitride film for tungsten-silicide substratesVANGUARD INT SEMICONDUCT CORP·Filed 1998·Granted Oct 17, 2000·32 cites·4 claims
- 4166US11688610B2Feature patterning using pitch relaxation and directional end-pushing with ion bombardmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 27, 2023·0 cites·20 claims
- 4266US9748107B2Method for removing semiconductor fins using alternating masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 29, 2017·1 cites·20 claims
- 4365US8580637B2Method of patterning a semiconductor device having improved spacing and shape control and a semiconductor deviceCHEN JHUN HUA·Filed 2011·Granted Nov 12, 2013·2 cites·20 claims
- 4464US12120886B2Memory device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 15, 2024·0 cites·20 claims
- 4562US11749570B2Etch monitoring and performingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 5, 2023·0 cites·20 claims
- 4662US10853552B2Method for improving circuit layout for manufacturabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 1, 2020·0 cites·20 claims
- 4761US11448956B2EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 20, 2022·0 cites·20 claims
- 4861US8656319B2Optical proximity correction convergence controlKUO CHENG-CHENG·Filed 2012·Granted Feb 18, 2014·1 cites·20 claims
- 4961US6183916B1Method for proximity effect compensation on alternative phase-shift masks with bias and optical proximity correctionTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Feb 6, 2001·20 cites·17 claims
- 5059US11996297B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 28, 2024·0 cites·20 claims
Showing the top 50 of 77 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →