Inventor · disambiguated record
Hui-Chan Yun
Also filed as: YUN HUI-CHAN
22 granted patents·7 pending applications·108 citations·filing 2005–2015
93Inventor score
Top patents by PatentIndex Score
29 records- 0195US7378217B2Antireflective hardmask composition and methods for using sameCHEIL IND INC·Filed 2006·Granted May 27, 2008·25 cites·14 claims
- 0289US7829219B2Cathode for lithium secondary batteries having improved coating properties and lithium secondary batteries using the sameECOPRO CO LTD·Filed 2005·Granted Nov 9, 2010·13 cites·25 claims
- 0389US7514199B2Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the sameCHEIL IND INC·Filed 2006·Granted Apr 7, 2009·12 cites·49 claims
- 0488US8524851B2Silicon-based hardmask composition and process of producing semiconductor integrated circuit device using the sameKIM SANG KYUN·Filed 2010·Granted Sep 3, 2013·13 cites·15 claims
- 0585US8058711B2Filler for filling a gap and method for manufacturing semiconductor capacitor using the sameLIM SANG-HAK·Filed 2010·Granted Nov 15, 2011·10 cites·18 claims
- 0683US7625670B2Cathode material for secondary batteries with non-aqueous electrolyte, a process for preparing the cathode material and lithium secondary battery containing the sameECOPRO CO LTD·Filed 2006·Granted Dec 1, 2009·11 cites·10 claims
- 0778US7405029B2Antireflective hardmask composition and methods for using sameCHEIL IND INC·Filed 2006·Granted Jul 29, 2008·5 cites·12 claims
- 0874US7629260B2Organosilane hardmask compositions and methods of producing semiconductor devices using the sameCHEIL IND INC·Filed 2006·Granted Dec 8, 2009·4 cites·11 claims
- 0972US9082612B2Composition for forming a silica layer, method of manufacturing the composition, silica layer prepared using the composition, and method of manufacturing the silica layerYUN HUI-CHAN·Filed 2011·Granted Jul 14, 2015·4 cites·13 claims
- 1072US8273519B2Hardmask composition and associated methodsKIM MI YOUNG·Filed 2007·Granted Sep 25, 2012·4 cites·10 claims
- 1171US9096726B2Composition for forming silica based insulating layer, method for manufacturing composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layerLIM SANG-HAK·Filed 2011·Granted Aug 4, 2015·3 cites·10 claims
- 1267US9291899B2Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the sameCHO HYEON-MO·Filed 2009·Granted Mar 22, 2016·2 cites·13 claims
- 1367US9140986B2Resist underlayer composition and process of producing integrated circuit devices using the sameKIM MI-YOUNG·Filed 2012·Granted Sep 22, 2015·2 cites·11 claims
- 1450US9738787B2Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layerCHEIL IND INC·Filed 2013·Granted Aug 22, 2017·0 cites·9 claims
- 1548US9890255B2Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for formingCHEIL IND INC·Filed 2013·Granted Feb 13, 2018·0 cites·19 claims
- 1647US8916329B2Hardmask composition and associated methodsKIM SANG KYUN·Filed 2009·Granted Dec 23, 2014·0 cites·18 claims
- 1747US7879526B2Hardmask compositions for resist underlayer filmsCHEIL IND INC·Filed 2006·Granted Feb 1, 2011·0 cites·26 claims
- 1845US2015041959A1Hardmask composition for forming resist underlayer film, process for producing a semiconductor integrated circuit device, and semiconductor integrated circuit deviceSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 1944US10427944B2Composition for forming a silica based layer, silica based layer, and electronic deviceSAMSUNG SDI CO LTD·Filed 2015·Granted Oct 1, 2019·0 cites·16 claims
- 2044US8758981B2Photoresist underlayer composition and method of manufacturing semiconductor device by using the sameKIM MI-YOUNG·Filed 2012·Granted Jun 24, 2014·0 cites·15 claims
- 2143US2007212886A1Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositionsUH DONG SEON·Filed 2006·Application pending·0 cites
- 2242US9957418B2Composition for forming silica layer, method for manufacturing silica layer, and silica layerSAMSUNG SDI CO LTD·Filed 2015·Granted May 1, 2018·0 cites·17 claims
- 2341US8766411B2Filler for filling a gap, method of preparing the same and method of manufacturing semiconductor capacitor using the samePARK EUN-SU·Filed 2012·Granted Jul 1, 2014·0 cites·8 claims
- 2440US2014346391A1Polysiloxane hydroxide thin-film rinse solution, and polysilooxazine hydroxide thin-film pattern-forming method using the sameCHEIL IND INC·Filed 2012·Application pending·0 cites
- 2539US10020185B2Composition for forming silica layer, silica layer, and electronic deviceSAMSUNG SDI CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·16 claims
- 2639US2010320573A1Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositionsUH DONG SEON·Filed 2010·Application pending·0 cites
- 2734US2011241175A1Hardmask composition for forming resist underlayer film, process for producing a semiconductor integrated circuit device, and semiconductor integrated circuit deviceKOH SANG RAN·Filed 2011·Application pending·0 cites
- 2834US2012270143A1Resist underlayer composition and method of manufacturing semiconductor integrated circuit devices using the sameYUN HUI-CHAN·Filed 2012·Application pending·0 cites
- 2931US2016172188A1Rinse solution for silica thin film, method of producing silica thin film, and silica thin filmSAMSUNG SDI CO LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →