Inventor · disambiguated record
Hwan Jung
Also filed as: JUNG HWAN · JUNG HWAN YONG
0 granted patents·3 pending applications·0 citations·filing 2009–2023
Top patents by PatentIndex Score
3 records- 0146US2023407177A1Etching gas composition, substrate processing apparatus, and pattern forming method using the etching gas compositionSEMES CO LTD·Filed 2023·Application pending·0 cites
- 0245US2023313039A1Etching gas composition, substrate processing apparatus, and pattern forming method using the sameSEMES CO LTD·Filed 2023·Application pending·0 cites
- 0343US2010147563A1Substrate having electromagnetic shielding memberSAMSUNG ELECTRO MECH·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →