Inventor · disambiguated record
Hyung-Sik Hong
Also filed as: HONG HYUNG KI · HONG HYUNG-SIK
11 granted patents·5 pending applications·98 citations·filing 1998–2009
89Inventor score
Top patents by PatentIndex Score
16 records- 0185US6537143B1Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Mar 25, 2003·32 cites·9 claims
- 0276US6858854B2Method and apparatus for measuring inclination angle of ion beamSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 22, 2005·22 cites·36 claims
- 0373US6860801B2Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 1, 2005·14 cites·4 claims
- 0465US6720533B2Heater assembly for heating a waferSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Apr 13, 2004·11 cites·12 claims
- 0563US6924072B2Method for exposing a peripheral area of a wafer and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 2, 2005·8 cites·10 claims
- 0646US2004177529A1Drying device and methodFiled 2004·Application pending·0 cites
- 0745US2010068881A1Method of forming metallization in a semiconductor device using selective plasma treatmentKANG JOO-HO·Filed 2009·Application pending·0 cites
- 0844US6795162B2Method for exposing a peripheral area of a wafer and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Sep 21, 2004·1 cites·9 claims
- 0944US2008041308A1Substrate treatment apparatus and cleaning methodSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1043US6705020B2Method of and apparatus for use in orienting an object at a reference angleSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 16, 2004·3 cites·20 claims
- 1142US7112810B2Ion implanting apparatus and ion implanting method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Sep 26, 2006·1 cites·23 claims
- 1240US6590378B2Real time parameter monitoring apparatus for high voltage chamber in semiconductor wafer processing systemSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jul 8, 2003·1 cites·15 claims
- 1336US6903336B2Polarity exchanger and ion implanter having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 7, 2005·0 cites·19 claims
- 1436US2003107866A1Electrostatic chuck of an ion implanterFiled 2002·Application pending·0 cites
- 1535US2005022742A1Chemical vapor deposition processing equipment for use in fabricating a semiconductor deviceFiled 2004·Application pending·0 cites
- 1627US6099242AWafer aligning apparatus for semiconductor device fabricationSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Aug 8, 2000·5 cites·7 claims
Join the waitlist — get patent alerts
Get an alert when Hyung-Sik Hong files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →