Inventor · disambiguated record
Hyeonok Jung
Also filed as: JUNG HYEONOK
8 granted patents·4 pending applications·19 citations·filing 2015–2024
79Inventor score
Top patents by PatentIndex Score
12 records- 0194US11114445B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Sep 7, 2021·4 cites·20 claims
- 0290US9627387B2Semiconductor device and method for manufacturing the sameJUNG HYEONOK·Filed 2015·Granted Apr 18, 2017·15 cites·21 claims
- 0374US11917815B2Semiconductor and manufacturing method of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Feb 27, 2024·0 cites·20 claims
- 0470US11616066B2Semiconductor device and manufacturing method of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 28, 2023·0 cites·20 claims
- 0567US11088143B2Semiconductor and manufacturing method of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Aug 10, 2021·0 cites·16 claims
- 0663US2024178291A1Transistor unit including shared gate structure, and sub-word line driver and semiconductor device based on the same transistor unitSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0753US11929414B2Transistor unit including shared gate structure, and sub-word line driver and semiconductor device based on the same transistor unitSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 12, 2024·0 cites·22 claims
- 0853US2023247825A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0952US2024284664A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1052US2023209814A1Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1150US10312105B2Semiconductor devices using auxiliary layers for trimming margin and devices so formedSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jun 4, 2019·0 cites·5 claims
- 1247US9691627B2Methods of forming semiconductor devices using auxiliary layers for trimming marginSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jun 27, 2017·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →