Inventor · disambiguated record
Hyung-Ho Ko
Also filed as: KO HYUNG-HO
20 granted patents·7 pending applications·100 citations·filing 2001–2022
92Inventor score
Top patents by PatentIndex Score
27 records- 0187US7176041B2PAA-based etchant, methods of using same, and resultant structuresSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 13, 2007·32 cites·17 claims
- 0287US6565736B2Wet process for semiconductor device fabrication using anode water containing oxidative substances and cathode water containing reductive substances, and anode water and cathode water used in the wet processSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted May 20, 2003·42 cites·23 claims
- 0378US7435301B2Cleaning solution of silicon germanium layer and cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 14, 2008·6 cites·6 claims
- 0475US8414708B2Method and apparatus for cleaning photomaskJEONG YUN-SONG·Filed 2010·Granted Apr 9, 2013·4 cites·14 claims
- 0573US7354868B2Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixtureSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 8, 2008·4 cites·16 claims
- 0665US9122177B2Apparatus for cleaning photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Sep 1, 2015·1 cites·17 claims
- 0762US11885473B2Vehicle lamp having a light source unit with chip laterally spaced from optical axis of optical unit and a reflector central axis tilted with respect to the optical axisSL CORP·Filed 2022·Granted Jan 30, 2024·0 cites·16 claims
- 0861US7262141B2Methods for cleaning a semiconductor substrate having a recess channel regionSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 28, 2007·1 cites·19 claims
- 0959US10474034B2Phase shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Nov 12, 2019·0 cites·9 claims
- 1059US7318870B2Method of cleaning semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jan 15, 2008·7 cites·5 claims
- 1157US9417518B2Photomask and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Aug 16, 2016·0 cites·9 claims
- 1254US10042246B2Method of manufacturing photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Aug 7, 2018·0 cites·6 claims
- 1350US9989857B2Photomask and method of forming the same and methods of manufacturing electronic device and display device using the photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jun 5, 2018·0 cites·10 claims
- 1450US8058180B2Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixtureKWON DOO-WON·Filed 2008·Granted Nov 15, 2011·0 cites·15 claims
- 1550US2009023265A1Etching solution for removal of oxide film, method for preparing the same, and method of fabricating semiconductor deviceMUN CHANG-SUP·Filed 2008·Application pending·0 cites
- 1649US7989123B2Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Aug 2, 2011·0 cites·22 claims
- 1748US9341941B2Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 17, 2016·0 cites·19 claims
- 1847US6844229B2Method of manufacturing semiconductor device having storage electrode of capacitorSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jan 18, 2005·3 cites·17 claims
- 1947US2009239158A1Method of maintaining mask for semiconductor processWOO SANG-GYUN·Filed 2009·Application pending·0 cites
- 2045US2006183297A1Etching solution for removal of oxide film, method for preparing the same, and method of fabricating semiconductor deviceMUN CHANG-SUP·Filed 2005·Application pending·0 cites
- 2142US9370805B2Method of megasonic cleaning of an objectCHOI JAE-HYUCK·Filed 2012·Granted Jun 21, 2016·0 cites·13 claims
- 2241US2006027252A1Methods of processing substrates during semiconductor manufacturing processesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 2339US8293020B2Method of megasonic cleaning of an objectCHOI JAE-HYUCK·Filed 2010·Granted Oct 23, 2012·0 cites·9 claims
- 2438US2005074948A1Method of manufacturing shallow trench isolation structure using HF vapor etching processFiled 2004·Application pending·0 cites
- 2536US8784672B2Photomasks and methods of manufacturing the sameOH JONG-KEUN·Filed 2011·Granted Jul 22, 2014·0 cites·14 claims
- 2636US2003145875A1Apparatus and methods for cleaning semiconductor wafers using vaporized chemicalsSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 2736US2003062068A1Method of and system for cleaning a semiconductor wafer simultaneously using electrolytically ionized water and diluted hydrofluoric acidFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →