Inventor · disambiguated record
Hyo-Sun Lee
Also filed as: LEE HYO S · LEE HYO SUN
20 granted patents·11 pending applications·89 citations·filing 2003–2025
92Inventor score
Files withSAMSUNG ELECTRONICS CO LTD9LG CHEMICAL LTD7KOREA INST SCI & TECH3KYUNGPOOK NAT UNIV IND ACADEMIC COOP FOUND3KIM NAM-SOO2
Top patents by PatentIndex Score
31 records- 0196US7244805B2Bimetallic zinc complex and process of producing polycarbonate using the same as polymerization catalystLG CHEMICAL LTD·Filed 2005·Granted Jul 17, 2007·36 cites·7 claims
- 0288US10377948B2Etching composition and method for fabricating semiconductor device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 13, 2019·4 cites·19 claims
- 0387US7439378B2Fulvene, metallocene catalysts and preparation method thereof, and preparation of polyolefines copolymer using the sameLG CHEMICAL LTD·Filed 2007·Granted Oct 21, 2008·9 cites·19 claims
- 0485US10414978B2Etching composition and method for fabricating semiconductor device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Sep 17, 2019·3 cites·17 claims
- 0585US7294600B2Supported hybrid metallocene catalyst, method for preparing the same, and method for preparing polyolefin using the sameLG CHEMICAL LTD·Filed 2004·Granted Nov 13, 2007·23 cites·72 claims
- 0677US11380537B2Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layerSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jul 5, 2022·2 cites·8 claims
- 0776US9329296B2Underwater detector and method for underwater detectionKOREA INST GEOSCIENCE & MINERA·Filed 2015·Granted May 3, 2016·2 cites·5 claims
- 0875US10793775B2Etching composition and method for fabricating semiconductor device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 6, 2020·1 cites·13 claims
- 0972US7271277B2Fulvene, metallocene catalysts and preparation method thereof, and preparation of polyolefines copolymer using the sameLG CHEMICAL LTD·Filed 2003·Granted Sep 18, 2007·9 cites·16 claims
- 1067US11198815B2Etching composition and method for fabricating semiconductor device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Dec 14, 2021·0 cites·20 claims
- 1163US2024294705A1Transition metal complex catalyst composition for polymerization of monomer having cyclic ester group and method of producing polymer using the sameKYUNGPOOK NAT UNIV IND ACADEMIC COOP FOUND·Filed 2023·Application pending·0 cites
- 1259US2024124624A1Imine-based ligand-containing complex catalyst for polymerizing cyclic olefinic monomer, and method for preparing cyclic olefinic polymer using sameKYUNGPOOK NAT UNIV IND ACADEMIC COOP FOUND·Filed 2022·Application pending·0 cites
- 1358US10800972B2Etching composition and method for fabricating semiconductor device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 13, 2020·0 cites·20 claims
- 1458US9040115B2Retardation compensators of negative C-type for liquid crystal displayLG CHEMICAL LTD·Filed 2013·Granted May 26, 2015·0 cites·11 claims
- 1555US2012252969A1Novel polyarylate and method for preparing thereofLEE HYO SUN·Filed 2012·Application pending·0 cites
- 1655US2007060737A1Novel polyarylate and method for preparing thereofLEE HYO S·Filed 2006·Application pending·0 cites
- 1754US10332740B2Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layerSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jun 25, 2019·0 cites·15 claims
- 1854US9507255B2Methods of manufacturing integrated circuit devices by using photomask cleaning compositionsSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Nov 29, 2016·0 cites·10 claims
- 1954US7682672B2Negative C-type compensation film and method of preparing the sameLG CHEMICAL LTD·Filed 2006·Granted Mar 23, 2010·0 cites·20 claims
- 2053US2025186981A1Catalyst composition for cyclic olefin polymerization, and method for preparing cyclic olefin-based oligomer or olefin-based polymer by using sameKYUNGPOOK NAT UNIV IND ACADEMIC COOP FOUND·Filed 2025·Application pending·0 cites
- 2152US7737244B2Process for preparing polyarylateLG CHEMICAL LTD·Filed 2007·Granted Jun 15, 2010·0 cites·16 claims
- 2249US10837115B2Pre-treatment composition before etching SiGe and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Nov 17, 2020·0 cites·10 claims
- 2348US2008045020A1Slurry Composition For a Chemical Mechanical Polishing Process, Method of Polishing an Object Layer and Method of Manufacturing a Semiconductor Memory Device Using the Slurry CompositionKIM NAM-SOO·Filed 2007·Application pending·0 cites
- 2445US8470413B2Retardation compensators of negative C-type for liquid crystal displayKIM HEE-JUNG·Filed 2007·Granted Jun 25, 2013·0 cites·9 claims
- 2544US2011027996A1Slurry composition for a chemical mechanical polishing process, method of polishing an object layer and method of manufacturing a semiconductor memory device using the slurry compositionKIM NAM-SOO·Filed 2010·Application pending·0 cites
- 2643US9057953B2Thinner composition for RRC process, apparatus for supplying the same, and thinner composition for EBR processYUN HYO-JIN·Filed 2012·Granted Jun 16, 2015·0 cites·18 claims
- 2743US8716192B2Micro RNAs for identification of exposure to lower aliphatic saturated aldehydes and the method of identification using thereofKOREA INST SCI & TECH·Filed 2012·Granted May 6, 2014·0 cites·9 claims
- 2843US2007148978A1Slurry compositions, methods of polishing polysilicon layers using the slurry compositions and methods of manufacturing semiconductor devices using the slurry compositionsHAN EUI-JIN·Filed 2006·Application pending·0 cites
- 2941US2013324428A1Specific biomarker for identification of exposure to lower aliphatic saturated aldehydes and the method of identification using the sameKOREA INST SCI & TECH·Filed 2012·Application pending·0 cites
- 3041US2013281311A1Specific biomarker for identificaton of exposure to propionaldehyde and the method of identification using the sameKOREA INST SCI & TECH·Filed 2012·Application pending·0 cites
- 3136US2018120472A1Apparatus and method for localizing underwater anomalous bodyKOREA INST GEOSCIENCE & MINERAL RESOURCES·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →