Inventor · disambiguated record
Hyungrang Moon
Also filed as: MOON HYUNGRANG
0 granted patents·19 pending applications·0 citations·filing 2022–2024
Files withSAMSUNG SDI CO LTD19
Top patents by PatentIndex Score
19 records- 0168US2025123568A1Composition for removing edge bead from metal containing resists, developer composition of metal containing resists, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0268US2025224682A1Composition for removing edge bead from metal containing resists, developer composition of metal containing resists and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0365US2024393694A1Metal containing photoresist developer composition, and method of forming patterns including step of developing using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0465US2025044696A1Composition for removing edge bead from metal containing resists, developer composition of metal containing resists, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0563US2024393684A1Method of forming patternsSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0663US2024385515A1Method of forming patternsSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0763US2024393698A1Composition for removing edge beads from metal-containing resists, developer composition of metal-containing resists, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0861US2025230355A1Composition for removing edge bead from metal containing resists, developer composition of metal containing resists, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0958US2023288799A1Method of forming patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1056US2023038110A1Composition for removing edge beads from metal containing resists, and method of forming patterns including step of removing edge beads using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1156US2024385522A1Composition for removing edge beads from metal containing resists, and method of forming patterns including step of removing edge beads utilizing the composition, and a system of forming patternsSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1256US2023037563A1Metal containing photoresist developer composition, and method of forming patterns including developing step using the sameSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1355US2024329536A1Composition for removing edge bead of metal-containing resist, and method for forming pattern comprising step of removing edge bead by using sameSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1455US2024369935A1Composition for removing edge bead from metal-containing resists, and method of forming patterns including step of removing edge bead using sameSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1554US2024272556A1Metal containing photoresist developer composition, and method of forming patterns including step of developing using the compositionSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 1653US2024329537A1Metal containing photoresist developer composition, and method of forming patterns including step of developing using the compositionSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 1751US2024019784A1Metal containing photoresist developer composition, and method of forming patterns including step of developing using the compositionSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 1849US2024288774A1Composition for removing edge bead of metal-containing resist and method for forming pattern comprising step of removing edge bead by using sameSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1949US2024319601A1Method of forming patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →