Inventor · disambiguated record
Hyeon Park
Also filed as: PARK HYEON · PARK HYEON JIN
11 granted patents·16 pending applications·5 citations·filing 2018–2025
80Inventor score
Files withSAMSUNG SDI CO LTD25ANDONG NATIONAL UNIV INDUSTRY ACADEMIC COOPERATION FOUNDATION1KOREA ADVACNED INSTITUTE OF SCIENCE AND TECH1
Top patents by PatentIndex Score
27 records- 0189US11249396B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2020·Granted Feb 15, 2022·2 cites·19 claims
- 0279US11048169B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Jun 29, 2021·2 cites·17 claims
- 0378US12313974B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2023·Granted May 27, 2025·0 cites·8 claims
- 0474US2024409885A1Novel bacillus velezensis gyun-1190 strain and use thereofANDONG NATIONAL UNIV INDUSTRY ACADEMIC COOPERATION FOUNDATION·Filed 2023·Application pending·0 cites
- 0570US11982943B2Method of forming patterns using resist underlayer compositionSAMSUNG SDI CO LTD·Filed 2022·Granted May 14, 2024·0 cites·15 claims
- 0665US11675271B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Jun 13, 2023·0 cites·8 claims
- 0765US10732504B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Aug 4, 2020·1 cites·10 claims
- 0861US2024427248A1Resist topcoat composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0961US2023028244A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1060US2024393692A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1160US2025284197A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2025·Application pending·0 cites
- 1259US11385545B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Jul 12, 2022·0 cites·14 claims
- 1357US2023024422A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1456US2023103089A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1555US2025284196A1Resist topcoat compositions and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1654US2025216785A1Resist topcoat compositions, and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1753US2024337933A1Resist topcoat composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 1852US11698587B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Jul 11, 2023·0 cites·11 claims
- 1951US2023288809A1Composition for resist underlayer and pattern formation method using sameSAMSUNG SDI CO LTD·Filed 2021·Application pending·0 cites
- 2050US12130552B2Composition for resist underlayer, and pattern forming method using sameSAMSUNG SDI CO LTD·Filed 2020·Granted Oct 29, 2024·0 cites·14 claims
- 2149US11987561B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted May 21, 2024·0 cites·17 claims
- 2249US2023032354A1Method for forming photoresist patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2348US2025076764A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 2448US2023026579A1Method for forming photoresist patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2548US2025076765A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 2641US2021166791A1Apparatus and method for constructing library for deriving material compositionKOREA ADVACNED INSTITUTE OF SCIENCE AND TECH·Filed 2019·Application pending·0 cites
- 2737US11493848B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Nov 8, 2022·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →