Inventor · disambiguated record
Hyeon Woo Park
Also filed as: PARK HYEON WOO
7 granted patents·4 pending applications·1 citations·filing 2007–2024
69Inventor score
Top patents by PatentIndex Score
11 records- 0169US10982144B2Silicon nitride layer etching composition and etching method using the sameENF TECHNOLOGY CO LTD·Filed 2019·Granted Apr 20, 2021·1 cites·17 claims
- 0263US2025333832A1Snout control system, and hot-dip galvanizing equipment comprising sameHYUNDAI STEEL CO·Filed 2023·Application pending·0 cites
- 0358US11987740B2Silicon nitride film etching composition and etching method using the sameENF TECHNOLOGY CO LTD·Filed 2021·Granted May 21, 2024·0 cites·13 claims
- 0458US2025171689A1Etching composition for silicon nitride layerENF TECHNOLOGY CO LTD·Filed 2024·Application pending·0 cites
- 0552US12031077B2Etching composition for metal nitride layer and etching method using the sameENF TECHNOLOGY CO LTD·Filed 2022·Granted Jul 9, 2024·0 cites·9 claims
- 0650US11939505B2Silicon nitride film etching composition and etching method using the sameENF TECHNOLOGY CO LTD·Filed 2021·Granted Mar 26, 2024·0 cites·14 claims
- 0748US11091695B2Etching composition and etching method using the sameENF TECHNOLOGY CO LTD·Filed 2020·Granted Aug 17, 2021·0 cites·4 claims
- 0846US2022089953A1Silicon nitride film etching composition and etching method using the sameENF TECHNOLOGY CO LTD·Filed 2021·Application pending·0 cites
- 0941US11149201B2Silicon nitride layer etching compositionENF TECHNOLOGY CO LTD·Filed 2019·Granted Oct 19, 2021·0 cites·8 claims
- 1040US2010191171A1Iontophoresis deviceLG HOUSEHOLD & HEALTH CARE LTD·Filed 2007·Application pending·0 cites
- 1139US10920142B2Polysiloxane-based compound, silicon nitride layer etching composition including the sameENF TECHNOLOGY CO LTD·Filed 2019·Granted Feb 16, 2021·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →