Inventor · disambiguated record
Hyun-Ji Song
Also filed as: SONG HYUN-JI
24 granted patents·13 pending applications·17 citations·filing 2007–2024
91Inventor score
Top patents by PatentIndex Score
37 records- 0184US9971243B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted May 15, 2018·2 cites·15 claims
- 0278US10438311B2Watermark embedding apparatus and method, and watermark detecting apparatus and method for 3D printing environmentKOREA ADVANCED INST SCI & TECH·Filed 2017·Granted Oct 8, 2019·4 cites·6 claims
- 0376US10066057B2Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Sep 4, 2018·2 cites·20 claims
- 0476US9665003B2Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2014·Granted May 30, 2017·3 cites·18 claims
- 0571US10312074B2Method of producing layer structure, layer structure, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 4, 2019·2 cites·31 claims
- 0668US9348229B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2014·Granted May 24, 2016·2 cites·12 claims
- 0766US2024241438A1Photoresist composition and method of manufacturing integrated circuit device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0864US12429768B2Photosensitizing compound, photoresist composition including the same, and method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 0964US10788874B2Method and electronic device for controlling power between electronic devicesSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Sep 29, 2020·2 cites·18 claims
- 1061US2023028244A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1159US2024321483A1Wire structure, wire capacitor, and electronic device including the wire capacitorSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1258US2023097135A1Additive for photoresist, photoresist composition for euv including the same, and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1357US2023024422A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1454US12500079B2Semiconductor device manufacturing methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Dec 16, 2025·0 cites·18 claims
- 1554US9683114B2Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 20, 2017·0 cites·8 claims
- 1654US2025044706A1Method of predicting euv dose, method of designing pag using the same, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1751US9362030B2Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layerPARK EUN-SU·Filed 2014·Granted Jun 7, 2016·0 cites·8 claims
- 1850US9738787B2Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layerCHEIL IND INC·Filed 2013·Granted Aug 22, 2017·0 cites·9 claims
- 1949US2022252976A1Photoresist compositions and methods of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 2049US2023176477A1Photoresist composition and method of manufacturing integrated circuit device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 2149US2023131429A1Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 2249US2023032354A1Method for forming photoresist patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2348US9890255B2Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for formingCHEIL IND INC·Filed 2013·Granted Feb 13, 2018·0 cites·19 claims
- 2448US2023026579A1Method for forming photoresist patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2543US9574108B2Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layerPARK EUN-SU·Filed 2014·Granted Feb 21, 2017·0 cites·11 claims
- 2642US2015187566A1Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 2740US9568825B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Feb 14, 2017·0 cites·11 claims
- 2838US10345706B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionSONG HYUN JI·Filed 2014·Granted Jul 9, 2019·0 cites·10 claims
- 2938US10332751B2Monomer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 25, 2019·0 cites·15 claims
- 3037US9240443B2Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agentBAE JIN-HEE·Filed 2013·Granted Jan 19, 2016·0 cites·16 claims
- 3136US9312122B2Rinse liquid for insulating film and method of rinsing insulating filmBAE JIN-HEE·Filed 2013·Granted Apr 12, 2016·0 cites·11 claims
- 3234US9371444B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 21, 2016·0 cites·14 claims
- 3332US10018914B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·5 claims
- 3431US9874812B2Methods of forming hardmask material filmKIM Myeong-koo·Filed 2016·Granted Jan 23, 2018·0 cites·20 claims
- 3530US10323124B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 18, 2019·0 cites·15 claims
- 3630US9908990B2Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Mar 6, 2018·0 cites·19 claims
- 3730US2008088378A1Phase locked loop having continuous bank calibration unit and method of preventing unlocking of pllFCI INC·Filed 2007·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Hyun-Ji Song files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →