Inventor · disambiguated record
Hyou Takahashi
Also filed as: TAKAHASHI HYOU
20 granted patents·5 pending applications·63 citations·filing 2002–2017
92Inventor score
Top patents by PatentIndex Score
25 records- 0187US9268222B2Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection headCANON KK·Filed 2013·Granted Feb 23, 2016·5 cites·11 claims
- 0284US9707759B2Liquid-ejecting head and method of manufacturing the liquid-ejecting headCANON KK·Filed 2016·Granted Jul 18, 2017·2 cites·15 claims
- 0378US7326516B2Resist composition for immersion exposure and pattern formation method using the sameFUJIFILM CORP·Filed 2005·Granted Feb 5, 2008·7 cites·9 claims
- 0467US7425404B2Chemical amplification resist composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2005·Granted Sep 16, 2008·2 cites·8 claims
- 0565US8936350B2Print head and inkjet printing apparatusTAKEI YASUNORI·Filed 2012·Granted Jan 20, 2015·1 cites·6 claims
- 0664US8080361B2Positive photosensitive composition and method of forming pattern using the sameTAKAHASHI HYOU·Filed 2007·Granted Dec 20, 2011·7 cites·17 claims
- 0764US7083892B2Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Aug 1, 2006·6 cites·12 claims
- 0863US8975003B2Photosensitive negative resin compositionTAKAHASHI HYOU·Filed 2011·Granted Mar 10, 2015·1 cites·19 claims
- 0960US10859482B2Organic residue inspecting method and liquid discharge head producing methodCANON KK·Filed 2017·Granted Dec 8, 2020·0 cites·17 claims
- 1060US6902862B2Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Jun 7, 2005·16 cites·20 claims
- 1157US7285369B2Positive resist composition and pattern formation method using the sameFUJIFILM CORP·Filed 2004·Granted Oct 23, 2007·5 cites·7 claims
- 1253US7094515B2Stimulus sensitive compound and stimulus sensitive composition containing the sameFUJI PHOTO FILM CO LTD·Filed 2004·Granted Aug 22, 2006·3 cites·15 claims
- 1350US9046766B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using sameKATO TAKAYUKI·Filed 2009·Granted Jun 2, 2015·0 cites·16 claims
- 1450US2006147837A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2006·Application pending·0 cites
- 1549US8785110B2Liquid ejection head and method of manufacturing the sameCANON KK·Filed 2013·Granted Jul 22, 2014·0 cites·12 claims
- 1648US7521168B2Resist composition for electron beam, EUV or X-rayFUJIFILM CORP·Filed 2003·Granted Apr 21, 2009·8 cites·56 claims
- 1746US7914965B2Resist composition and method of pattern formation with the sameFUJIFILM CORP·Filed 2005·Granted Mar 29, 2011·0 cites·19 claims
- 1845US9707757B2Photosensitive negative resin compositionCANON KK·Filed 2014·Granted Jul 18, 2017·0 cites·6 claims
- 1940US7241551B2Positive-working resist compositionFUJIFILM CORP·Filed 2004·Granted Jul 10, 2007·0 cites·11 claims
- 2039US2005079441A1Positive resist composition and pattern forming method using the sameFUJI PHOTO FILM CO LTD·Filed 2004·Application pending·0 cites
- 2139US2018143534A1Liquid ejection head, method for producing liquid ejection head, and printing methodCANON KK·Filed 2017·Application pending·0 cites
- 2238US9052594B2Positive photosensitive composition and method of forming pattern using the sameTAKAHASHI HYOU·Filed 2011·Granted Jun 9, 2015·0 cites·21 claims
- 2338US7105273B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Sep 12, 2006·0 cites·6 claims
- 2437US2004053160A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Application pending·0 cites
- 2536US2003165772A1Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →