Inventor · disambiguated record
Hyo-Jin Yun
Also filed as: YUN HYO-JIN
11 granted patents·6 pending applications·26 citations·filing 2006–2016
85Inventor score
Top patents by PatentIndex Score
17 records- 0182US8871423B2Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the sameYUN HYO-JIN·Filed 2011·Granted Oct 28, 2014·6 cites·13 claims
- 0282US7527913B2Photoacid generators, photoresist composition including the same and method of forming pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted May 5, 2009·7 cites·13 claims
- 0379US9837272B2Methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Dec 5, 2017·3 cites·20 claims
- 0477US9425059B2Methods of forming a pattern and methods of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Aug 23, 2016·1 cites·17 claims
- 0565US9773672B2Method of forming micropatternsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 26, 2017·1 cites·16 claims
- 0662US8247162B2Methods of forming a pattern using photoresist compositionsPARK JI-MAN·Filed 2010·Granted Aug 21, 2012·1 cites·10 claims
- 0755US7491484B2Photoresist compositions and methods of forming a pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 17, 2009·4 cites·15 claims
- 0852US7494761B2Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 24, 2009·0 cites·11 claims
- 0949US7964332B2Methods of forming a pattern of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jun 21, 2011·3 cites·15 claims
- 1046US2008311527A1Method of forming protection layer on photoresist pattern and method of forming fine pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1144US2008070155A1Inclusion complex, photoresist composition having the inclusion complex and method of forming a pattern using the photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1244US2008102403A1Photoresist compositions and methods of forming a pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1343US9057953B2Thinner composition for RRC process, apparatus for supplying the same, and thinner composition for EBR processYUN HYO-JIN·Filed 2012·Granted Jun 16, 2015·0 cites·18 claims
- 1441US2007166644A1Photoresist composition and method of forming a photoresist pattern using the sameKIM BOO-DEUK·Filed 2007·Application pending·0 cites
- 1534US7485407B2Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Feb 3, 2009·0 cites·10 claims
- 1634US2011244397A1Methods of Fabricating a MicroarrayKIM MYUNG-SUN·Filed 2011·Application pending·0 cites
- 1734US2011201528A1Methods Of Forming An Oligomer ArrayBAEK SE-KYUNG·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →