Inventor · disambiguated record
I-Chang Shih
Also filed as: SHIH I-CHANG
9 granted patents·2 pending applications·89 citations·filing 2012–2023
84Inventor score
Files withTAIWAN FU HSING IND CO LTD6TAIWAN SEMICONDUCTOR MFG3SHIH I-CHANG1TAIWAN SEMICONDUCTOR MFG CO LTD1
Top patents by PatentIndex Score
11 records- 0192US9367655B2Topography-aware lithography pattern checkSHIH I-CHANG·Filed 2012·Granted Jun 14, 2016·69 cites·20 claims
- 0283US8952329B13D image profiling techniques for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Feb 10, 2015·6 cites·19 claims
- 0379US8910092B1Model based simulation method with fast bias contour for lithography process checkTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 9, 2014·6 cites·18 claims
- 0476US11315355B2Electric lock and control method thereofTAIWAN FU HSING IND CO LTD·Filed 2020·Granted Apr 26, 2022·1 cites·18 claims
- 0576US10515498B2Electric lock and control method thereofTAIWAN FU HSING IND CO LTD·Filed 2018·Granted Dec 24, 2019·5 cites·17 claims
- 0663US9189587B2Chip level critical point analysis with manufacturer specific dataTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 17, 2015·1 cites·20 claims
- 0761US11131120B2Electric lock and control method thereofTAIWAN FU HSING IND CO LTD·Filed 2019·Granted Sep 28, 2021·1 cites·11 claims
- 0851US12119699B2Method for periodically activating battery unit and electronic deviceTAIWAN FU HSING IND CO LTD·Filed 2021·Granted Oct 15, 2024·0 cites·18 claims
- 0950US2024218699A1Electric Lock and Control Method ThereofTAIWAN FU HSING IND CO LTD·Filed 2023·Application pending·0 cites
- 1048US9159577B2Method of forming substrate patternTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Oct 13, 2015·0 cites·20 claims
- 1147US2022341215A1Lock device capable of magnetic sensing, bolt calibration method, and door calibration methodTAIWAN FU HSING IND CO LTD·Filed 2022·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when I-Chang Shih files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →