Inventor · disambiguated record
Ichiro Hayashida
Also filed as: HAYASHIDA ICHIRO
15 granted patents·3 pending applications·724 citations·filing 1992–2013
95Inventor score
Files withWAKO PURE CHEM IND LTD14FUJIMI INC1MATSUDA OSAMU1MIZUTA HIRONORI1WAKO PURE CHEMCIAL IND LTD1
Top patents by PatentIndex Score
18 records- 0194US6514921B1Cleaning agentWAKO PURE CHEM IND LTD·Filed 2000·Granted Feb 4, 2003·77 cites·17 claims
- 0293US6310019B1Cleaning agent for a semi-conductor substrateWAKO PURE CHEM IND LTD·Filed 2000·Granted Oct 30, 2001·65 cites·9 claims
- 0392US5290361ASurface treating cleaning methodWAKO PURE CHEM IND LTD·Filed 1992·Granted Mar 1, 1994·273 cites·8 claims
- 0491US6534458B1Cleaning agent for a semi-conductor substrateWAKO PURE CHEM IND LTD·Filed 2000·Granted Mar 18, 2003·55 cites·22 claims
- 0588US6410494B2Cleaning agentWAKO PURE CHEM IND LTD·Filed 2001·Granted Jun 25, 2002·42 cites·22 claims
- 0687US6143705ACleaning agentWAKO PURE CHEM IND LTD·Filed 1997·Granted Nov 7, 2000·75 cites·2 claims
- 0783US7375066B2Semiconductor wafer cleaning agent and cleaning methodWAKO PURE CHEM IND LTD·Filed 2001·Granted May 20, 2008·25 cites·31 claims
- 0881US5580846ASurface treating agents and treating process for semiconductorsWAKO PURE CHEM IND LTD·Filed 1995·Granted Dec 3, 1996·53 cites·9 claims
- 0977US8513139B2Etching agent, etching method and liquid for preparing etching agentMATSUDA OSAMU·Filed 2008·Granted Aug 20, 2013·7 cites·27 claims
- 1076US6716803B2Cleaning agent for a semi-conductor substrateWAKO PURE CHEMCIAL IND LTD·Filed 2001·Granted Apr 6, 2004·18 cites·1 claims
- 1168US8900371B2Cleaning agent for substrate and cleaning methodMIZUTA HIRONORI·Filed 2011·Granted Dec 2, 2014·2 cites·7 claims
- 1264US5840127ASurface treating agents and treating process for semiconductorsWAKO PURE CHEM IND LTD·Filed 1996·Granted Nov 24, 1998·25 cites·4 claims
- 1353US8871653B2Etching agent, etching method and liquid for preparing etching agentWAKO PURE CHEM IND LTD·Filed 2013·Granted Oct 28, 2014·0 cites·32 claims
- 1453US7481949B2Polishing composition and rinsing compositionFUJIMI INC·Filed 2003·Granted Jan 27, 2009·5 cites·17 claims
- 1548US7700532B2Cleaning composition and method of cleaning therewithWAKO PURE CHEM IND LTD·Filed 2003·Granted Apr 20, 2010·2 cites·6 claims
- 1645US2009227115A1Etching solution for substrateWAKO PURE CHEM IND LTD·Filed 2007·Application pending·0 cites
- 1742US2004077512A1Cleaning agent for a semi-conductor substrateWAKO PURE CHEM IND LTD·Filed 2003·Application pending·0 cites
- 1842US2007235061A1Cleaning Agent for Substrate and Cleaning MethodWAKO PURE CHEM IND LTD·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →