Inventor · disambiguated record
Ichiro Hide
Also filed as: HIDE ICHIRO
11 granted patents·1 pending application·20 citations·filing 1984–2022
84Inventor score
Top patents by PatentIndex Score
12 records- 0161US12001136B2Pellicle intermediary body, pellicle, method for manufacturing of pellicle intermediary body, and pellicle manufacturing methodAIR WATER INC·Filed 2020·Granted Jun 4, 2024·0 cites·8 claims
- 0254US11626283B2Compound semiconductor substrate, a pellicle film, and a method for manufacturing a compound semiconductor substrateAIR WATER INC·Filed 2022·Granted Apr 11, 2023·0 cites·5 claims
- 0348US11119402B2Method for manufacturing of pellicleAIR WATER INC·Filed 2017·Granted Sep 14, 2021·0 cites·8 claims
- 0447US11231647B2Pellicle and method for manufacturing pellicleAIR WATER INC·Filed 2018·Granted Jan 25, 2022·0 cites·20 claims
- 0547US10563307B2Method for manufacturing substrateAIR WATER INC·Filed 2017·Granted Feb 18, 2020·0 cites·11 claims
- 0641US4553919AApparatus for producing polyacetylene filmHOXAN KK·Filed 1984·Granted Nov 19, 1985·6 cites·3 claims
- 0735US4544343AApparatus for producing polyacetylene filmHOXAN KK·Filed 1984·Granted Oct 1, 1985·4 cites·3 claims
- 0834US2020152455A1A Compound Semiconductor Substrate, A Pellicle Film, And A Method For Manufacturing A Compound Semiconductor SubstrateAIR WATER INC·Filed 2017·Application pending·0 cites
- 0932US4663123AApparatus for producing polyacetylene filmHOXAN KK·Filed 1984·Granted May 5, 1987·3 cites·7 claims
- 1030US4820145APolycrystalline silicon wafer trayHOXAN KK·Filed 1986·Granted Apr 11, 1989·3 cites·1 claims
- 1129US5167758AMethod of forming polycrystalline silicon layer on semiconductor waferHOXAN KK·Filed 1989·Granted Dec 1, 1992·2 cites·8 claims
- 1229US4745163ACatalytic film polymerization of acetyleneHOXAN KK·Filed 1986·Granted May 17, 1988·2 cites·5 claims
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