Inventor · disambiguated record
Ichiro Nakayama
Also filed as: NAKAYAMA ICHIRO
63 granted patents·16 pending applications·1,754 citations·filing 1988–2013
99Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD28PANASONIC CORP23OKUMURA TOMOHIRO14NAKAYAMA ICHIRO6JAPAN SOFTWARE MAN CO LTD1
Top patents by PatentIndex Score
79 records- 0199US6093457AMethod for plasma processingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Jul 25, 2000·294 cites·20 claims
- 0298US6030667AApparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasmaMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Feb 29, 2000·194 cites·6 claims
- 0397US5404079APlasma generating apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Apr 4, 1995·136 cites·8 claims
- 0495US7601619B2Method and apparatus for plasma processingPANASONIC CORP·Filed 2006·Granted Oct 13, 2009·32 cites·23 claims
- 0595US4912065APlasma doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1988·Granted Mar 27, 1990·171 cites·5 claims
- 0693US4937205APlasma doping process and apparatus thereforMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1988·Granted Jun 26, 1990·160 cites·14 claims
- 0791US5888413APlasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Mar 30, 1999·125 cites·16 claims
- 0890US5558722APlasma processing apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Sep 24, 1996·80 cites·8 claims
- 0989US7456085B2Method for introducing impuritiesPANASONIC CORP·Filed 2005·Granted Nov 25, 2008·14 cites·10 claims
- 1085US5609690AVacuum plasma processing apparatus and methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Mar 11, 1997·80 cites·19 claims
- 1185US4906464AMethod for preparing dispersions containing antibiotic powerSHINAGAWA FUEL CO LTD·Filed 1988·Granted Mar 6, 1990·81 cites·10 claims
- 1281US7666770B2Method of controlling impurity doping and impurity doping apparatusPANASONIC CORP·Filed 2004·Granted Feb 23, 2010·24 cites·25 claims
- 1380US8450819B2Plasma doping method and apparatus thereofOKUMURA TOMOHIRO·Filed 2011·Granted May 28, 2013·6 cites·6 claims
- 1479US7759254B2Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing devicePANASONIC CORP·Filed 2004·Granted Jul 20, 2010·21 cites·24 claims
- 1579US7192854B2Method of plasma dopingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Mar 20, 2007·22 cites·11 claims
- 1677US5332880AMethod and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric fieldMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jul 26, 1994·44 cites·19 claims
- 1776US8802567B2Plasma processing methodPANASONIC CORP·Filed 2013·Granted Aug 12, 2014·3 cites·3 claims
- 1875US7135089B2Method and apparatus for plasma processingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Nov 14, 2006·2 cites·5 claims
- 1975US6875307B2Method and apparatus for plasma processingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Apr 5, 2005·8 cites·6 claims
- 2075US5922223APlasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Jul 13, 1999·28 cites·31 claims
- 2174US7858155B2Plasma processing method and plasma processing apparatusPANASONIC CORP·Filed 2005·Granted Dec 28, 2010·4 cites·33 claims
- 2274US7582492B2Method of doping impurities, and electronic element using the samePANASONIC CORP·Filed 2005·Granted Sep 1, 2009·4 cites·10 claims
- 2373US5693236AWater-repellent surface structure and its fabrication methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Dec 2, 1997·35 cites·5 claims
- 2471US5436424APlasma generating method and apparatus for generating rotating electrons in the plasmaMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jul 25, 1995·22 cites·6 claims
- 2570US7863168B2Plasma doping method and plasma doping apparatusPANASONIC CORP·Filed 2006·Granted Jan 4, 2011·2 cites·1 claims
- 2667US8550734B2Transportation guide mechanism and recording device having the sameNAKAYAMA ICHIRO·Filed 2009·Granted Oct 8, 2013·3 cites·5 claims
- 2766US7858479B2Method and apparatus of fabricating semiconductor devicePANASONIC CORP·Filed 2005·Granted Dec 28, 2010·2 cites·6 claims
- 2865US8129202B2Plasma doping method and apparatusOKUMURA TOMOHIRO·Filed 2009·Granted Mar 6, 2012·1 cites·21 claims
- 2965US7626184B2Impurity introducing apparatus and impurity introducing methodPANASONIC CORP·Filed 2008·Granted Dec 1, 2009·1 cites·5 claims
- 3064US10115565B2Plasma processing apparatus and plasma processing methodPANASONIC CORP·Filed 2013·Granted Oct 30, 2018·1 cites·10 claims
- 3163US8624340B2Plasma processing apparatus and method thereofOKUMURA TOMOHIRO·Filed 2011·Granted Jan 7, 2014·1 cites·14 claims
- 3262US7199064B2Plasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Apr 3, 2007·5 cites·12 claims
- 3362US6177646B1Method and device for plasma treatmentMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Jan 23, 2001·26 cites·39 claims
- 3461US6217951B1Impurity introduction method and apparatus thereof and method of manufacturing semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Apr 17, 2001·26 cites·26 claims
- 3558US2013174898A1Thin-film solar cell and manufacturing method thereofPANASONIC CORP·Filed 2012·Application pending·0 cites
- 3658US2013160849A1Polycrystalline silicon solar cell panel and manufacturing method thereofPANASONIC CORP·Filed 2012·Application pending·0 cites
- 3757US7622725B2Impurity introducing apparatus and impurity introducing methodPANASONIC CORP·Filed 2008·Granted Nov 24, 2009·0 cites·4 claims
- 3856US9397242B2Silicon substrate having textured surface, and process for producing sameTANIGUCHI YASUSHI·Filed 2012·Granted Jul 19, 2016·1 cites·11 claims
- 3956US8404573B2Plasma processing method and apparatusOKUMURA TOMOHIRO·Filed 2012·Granted Mar 26, 2013·0 cites·2 claims
- 4056US5851906AImpurity doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Dec 22, 1998·21 cites·3 claims
- 4155US7510667B2Plasma processing method and apparatusPANASONIC CORP·Filed 2006·Granted Mar 31, 2009·0 cites·6 claims
- 4255US6784080B2Method of manufacturing semiconductor device by sputter dopingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Aug 31, 2004·5 cites·50 claims
- 4354US7858537B2Plasma processing method and apparatusPANASONIC CORP·Filed 2006·Granted Dec 28, 2010·0 cites·7 claims
- 4454US5916820AThin film forming method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Jun 29, 1999·19 cites·15 claims
- 4553US8288259B2Plasma processing method and apparatusOKUMURA TOMOHIRO·Filed 2010·Granted Oct 16, 2012·0 cites·7 claims
- 4653US7575987B2Method of plasma dopingPANASONIC CORP·Filed 2006·Granted Aug 18, 2009·0 cites·10 claims
- 4753US2008196834A1Liquid phase etching method and liquid phase etching apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2008·Application pending·0 cites
- 4852US8772067B2Silicon substrate having textured surface, solar cell having same, and method for producing sameNAKAYAMA ICHIRO·Filed 2012·Granted Jul 8, 2014·0 cites·30 claims
- 4952US8709926B2Plasma doping method and plasma doping apparatusOKUMURA TOMOHIRO·Filed 2010·Granted Apr 29, 2014·0 cites·1 claims
- 5052US5711850APlasma processing apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Jan 27, 1998·13 cites·8 claims
Showing the top 50 of 79 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →