Inventor · disambiguated record
Ingi Kim
Also filed as: KIM INGI
13 granted patents·12 pending applications·15 citations·filing 2016–2025
85Inventor score
Files withSAMSUNG ELECTRONICS CO LTD25
Top patents by PatentIndex Score
25 records- 0187US11425833B2Electronic device including foldable conductive plateSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Aug 23, 2022·9 cites·20 claims
- 0284US10388537B2Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 20, 2019·3 cites·21 claims
- 0377US11823961B2Substrate inspection system and method of manufacturing semiconductor device using substrate inspection systemSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Nov 21, 2023·1 cites·20 claims
- 0476US9852921B2Substrate treating apparatus and method of treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Dec 26, 2017·2 cites·18 claims
- 0571US12474260B2Terahertz signal measuring apparatus and measuring methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Nov 18, 2025·0 cites·20 claims
- 0668US12439607B2Inspection deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Oct 7, 2025·0 cites·20 claims
- 0767US12339223B2Measuring apparatus and testing apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Jun 24, 2025·0 cites·20 claims
- 0863US2025189295A1Second harmonic generation (shg) measurement device and measurement method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0963US2021098261A1Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Application pending·0 cites
- 1062US12510491B2Apparatus for inspecting surface of objectSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Dec 30, 2025·0 cites·20 claims
- 1162US12469750B2Method of extracting properties of a layer on a waferSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Nov 11, 2025·0 cites·20 claims
- 1261US2025237622A1Device for measuring magnetic characteristicsSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 1361US2025003734A1Material measurement system and methodSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1459US2025014871A1Semiconductor processing apparatus using plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1557US12327579B2Inspection deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jun 10, 2025·0 cites·12 claims
- 1656US2024288265A1Semiconductor measurement apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1754US2025264324A1Semiconductor measurement system having monochromator and operating method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1854US2018315613A1Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 1953US11946809B2Polarization measuring device and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Apr 2, 2024·0 cites·19 claims
- 2051US2025035563A1Semiconductor measurement deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2150US10186427B2Substrate treating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jan 22, 2019·0 cites·14 claims
- 2248US11823927B2Wafer inspection apparatus and system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Nov 21, 2023·0 cites·20 claims
- 2348US2022120662A1Particle inspection device based on spatial modulation method and particle inspection method using the particle inspection deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Application pending·0 cites
- 2438US2018151395A1Cleaning composition, cleaning apparatus, and method for manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
- 2535US2016368030A1Liquid chemical supplying system, substrate processing system, and substrate processing methodSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →