Inventor · disambiguated record
Iraj Emami
Also filed as: EMAMI IRAJ
11 granted patents·470 citations·filing 1999–2006
92Inventor score
Files withADVANCED MICRO DEVICES INC11
Top patents by PatentIndex Score
11 records- 0194US6297644B1Multipurpose defect test structure with switchable voltage contrast capability and method of useADVANCED MICRO DEVICES INC·Filed 1999·Granted Oct 2, 2001·135 cites·30 claims
- 0292US6452412B1Drop-in test structure and methodology for characterizing an integrated circuit process flow and topographyADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 17, 2002·136 cites·8 claims
- 0390US7158896B1Real time immersion medium control using scatterometryADVANCED MICRO DEVICES INC·Filed 2004·Granted Jan 2, 2007·35 cites·25 claims
- 0484US7334202B1Optimizing critical dimension uniformity utilizing a resist bake plate simulatorADVANCED MICRO DEVICES INC·Filed 2005·Granted Feb 19, 2008·18 cites·25 claims
- 0576US7460922B1Scanner optimization for reduced across-chip performance variation through non-contact electrical metrologyADVANCED MICRO DEVICES INC·Filed 2005·Granted Dec 2, 2008·5 cites·20 claims
- 0676US7221060B1Composite alignment mark scheme for multi-layers in lithographyADVANCED MICRO DEVICES INC·Filed 2005·Granted May 22, 2007·4 cites·14 claims
- 0773US6560504B1Use of contamination-free manufacturing data in fault detection and classification as well as in run-to-run controlADVANCED MICRO DEVICES INC·Filed 1999·Granted May 6, 2003·47 cites·13 claims
- 0872US6268717B1Semiconductor test structure with intentional partial defects and method of useADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 31, 2001·43 cites·20 claims
- 0970US7373215B2Transistor gate shape metrology using multiple data sourcesADVANCED MICRO DEVICES INC·Filed 2006·Granted May 13, 2008·5 cites·19 claims
- 1061US6242273B1Fractal filter applied to a contamination-free manufacturing signal to improve signal-to-noise ratiosADVANCED MICRO DEVICES INC·Filed 1999·Granted Jun 5, 2001·24 cites·20 claims
- 1153US6294397B1Drop-in test structure and abbreviated integrated circuit process flow for characterizing production integrated circuit process flow, topography, and equipmentADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 25, 2001·18 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →