Inventor · disambiguated record
Isamu Hanyu
Also filed as: HANYU ISAMU
13 granted patents·320 citations·filing 1991–2003
94Inventor score
Files withFUJITSU LTD13
Top patents by PatentIndex Score
13 records- 0191US5465220AOptical exposure methodFUJITSU LTD·Filed 1993·Granted Nov 7, 1995·55 cites·6 claims
- 0282US5413951AComposite semiconductor substrate and a fabrication process thereofFUJITSU LTD·Filed 1993·Granted May 9, 1995·73 cites·19 claims
- 0379US6420094B1Optical exposure methodFUJITSU LTD·Filed 2000·Granted Jul 16, 2002·13 cites·2 claims
- 0478US6045976AOptical exposure methodFUJITSU LTD·Filed 1996·Granted Apr 4, 2000·29 cites·4 claims
- 0572US6207342B1Chemically amplified resist material and process for the formation of resist patternsFUJITSU LTD·Filed 1998·Granted Mar 27, 2001·42 cites·8 claims
- 0670US6986973B2Test photomask, flare evaluation method, and flare compensation methodFUJITSU LTD·Filed 2003·Granted Jan 17, 2006·15 cites·25 claims
- 0767US5607821AOptical exposure methodFUJITSU LTD·Filed 1995·Granted Mar 4, 1997·18 cites·15 claims
- 0859US5561010APhase shift optical mask and method of correcting defects in optical maskFUJITSU LTD·Filed 1995·Granted Oct 1, 1996·18 cites·14 claims
- 0957US5418093AProjection exposure method and an optical mask for use in projection exposureFUJITSU LTD·Filed 1994·Granted May 23, 1995·14 cites·15 claims
- 1051US5368963APhotomask and method of fabricating the sameFUJITSU LTD·Filed 1992·Granted Nov 29, 1994·10 cites·11 claims
- 1150US5876877APatterned mask having a transparent etching stopper layerFUJITSU LTD·Filed 1991·Granted Mar 2, 1999·10 cites·15 claims
- 1250US5506433AComposite semiconductor substrate having a single crystal substrate and a single crystal layer formed thereonFUJITSU LTD·Filed 1994·Granted Apr 9, 1996·17 cites·16 claims
- 1343US5428478AOptical mask and exposure method using the optical maskFUJITSU LTD·Filed 1993·Granted Jun 27, 1995·6 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →