Inventor · disambiguated record
Isao Hirano
Also filed as: HIRANO ISAO · UEHARA KEIICHI
18 granted patents·6 pending applications·121 citations·filing 1975–2023
91Inventor score
Files withTOKYO OHKA KOGYO CO LTD14HIRANO ISAO3MATSUSHITA SEIKO KK1NAT UNIV CORP YOKOHAMA NAT UNIV1NIPPON FLUTE CO LTD1
Top patents by PatentIndex Score
24 records- 0184US4171455APolyoxypropylene polyoxyethylene addition ether of higher branched primary saturated alcoholSHISEIDO CO LTD·Filed 1978·Granted Oct 16, 1979·17 cites·4 claims
- 0276US5511362ABox sealing method and apparatusNIPPON FLUTE CO LTD·Filed 1993·Granted Apr 30, 1996·38 cites·12 claims
- 0373US8354218B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2010·Granted Jan 15, 2013·2 cites·11 claims
- 0472US11355362B2Washing method, washing device, storage medium, and washing compositionTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jun 7, 2022·1 cites·13 claims
- 0571US11441101B2Cleaning composition, cleaning method, and method for manufacturing semiconductorTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Sep 13, 2022·1 cites·13 claims
- 0669US12485387B2Film cleaning solution and method for cleaning filmTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Dec 2, 2025·0 cites·10 claims
- 0769US2024034899A1Curable compositionTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 0867US4006672AVentilation fan (ventilation system)MATSUSHITA SEIKO KK·Filed 1975·Granted Feb 8, 1977·29 cites·2 claims
- 0962US8735052B2Surface modifying material, method of forming resist pattern, and method of forming patternHIRANO ISAO·Filed 2011·Granted May 27, 2014·1 cites·12 claims
- 1060US11981880B2Cleaning composition and cleaning method for component of semiconductor manufacturing process chamberTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted May 14, 2024·0 cites·6 claims
- 1159US5480371ABox forming equipmentNIPPON FLUTE COMPANY LTD·Filed 1993·Granted Jan 2, 1996·20 cites·9 claims
- 1256US2023292468A1Radiation sheet, heat dissipation plate, heat dissipation device and curable pasteTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 1355US11067506B2Hydrogen detection element, method for manufacturing hydrogen detection element, and hydrogen detection deviceNAT UNIV CORP YOKOHAMA NAT UNIV·Filed 2018·Granted Jul 20, 2021·0 cites·12 claims
- 1452US7803512B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Sep 28, 2010·4 cites·8 claims
- 1549US10155185B2Polyimide-based resin film cleaning liquid, method for cleaning polyimide-based resin film, method for producing polyimide coating, method for producing filter, filter medium, or filter device, and method for producing chemical solution for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Dec 18, 2018·0 cites·12 claims
- 1644US9212267B2Method of producing metal complex-supporting mesoporous materialTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Dec 15, 2015·0 cites·7 claims
- 1744US8728431B2Method of preparing carbon nanotubes and catalyst for producing carbon nanotubesONO TAKASHI·Filed 2012·Granted May 20, 2014·0 cites·3 claims
- 1843US11222781B2Method for removing organic cured film on substrate, and acidic cleaning liquidTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jan 11, 2022·0 cites·12 claims
- 1942US9192994B2Method for producing substrate having dispersed particles of dendrimer compound on the surface thereof, and substrate having dispersed particles of dendrimer compound on the surface thereofHIRANO ISAO·Filed 2012·Granted Nov 24, 2015·0 cites·4 claims
- 2040US2016280638A1Filtering material, filter, method of filtration, method of producing phenylimine compound, method of producing alkoxyphenylimine compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2016·Application pending·0 cites
- 2137US2017051084A1Filtering material, filtration filter, and filtration methodTOKYO OHKA KOGYO CO LTD·Filed 2016·Application pending·0 cites
- 2237US2017216814A1Filtration material, filtration filter, method for manufacturing filtration material, filtration method, copolymer, and method for manufacturing copolymerTOKYO OHKA KOGYO CO LTD·Filed 2015·Application pending·0 cites
- 2335US5062279AArtificial snowfall systemTOYO SEISAKUSHO KK·Filed 1991·Granted Nov 5, 1991·8 cites·6 claims
- 2434US2013089821A1Resist pattern formation method and pattern miniaturization agentHIRANO ISAO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →