Inventor · disambiguated record
J. Brett Rolfson
Also filed as: ROLFSON BRETT J · ROLFSON J B · ROLFSON J BRETT
147 granted patents·4 pending applications·5,038 citations·filing 1990–2013
99Inventor score
Files withMICRON TECHNOLOGY INC142ROLFSON J B3MICRON DISPLAY TECH INC2MICRON SEMICONDUCTOR INC2ROLFSON J BRETT1
Top patents by PatentIndex Score
151 records- 0199US5754390AIntegrated capacitor bottom electrode for use with conformal dielectricMICRON TECHNOLOGY INC·Filed 1996·Granted May 19, 1998·392 cites·11 claims
- 0298US5232549ASpacers for field emission display fabricated via self-aligned high energy ablationMICRON TECHNOLOGY INC·Filed 1992·Granted Aug 3, 1993·229 cites·22 claims
- 0398US5205770AMethod to form high aspect ratio supports (spacers) for field emission display using micro-saw technologyMICRON TECHNOLOGY INC·Filed 1992·Granted Apr 27, 1993·153 cites·20 claims
- 0498US5186670AMethod to form self-aligned gate structures and focus ringsMICRON TECHNOLOGY INC·Filed 1992·Granted Feb 16, 1993·194 cites·20 claims
- 0597US5329207AField emission structures produced on macro-grain polysilicon substratesMICRON TECHNOLOGY INC·Filed 1992·Granted Jul 12, 1994·109 cites·20 claims
- 0697US5229331AMethod to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technologyMICRON TECHNOLOGY INC·Filed 1992·Granted Jul 20, 1993·336 cites·20 claims
- 0796US5374868AMethod for formation of a trench accessible cold-cathode field emission deviceMICRON DISPLAY TECH INC·Filed 1992·Granted Dec 20, 1994·111 cites·19 claims
- 0896US5300463AMethod of selectively etching silicon dioxide dielectric layers on semiconductor wafersMICRON TECHNOLOGY INC·Filed 1992·Granted Apr 5, 1994·300 cites·20 claims
- 0996US5259799AMethod to form self-aligned gate structures and focus ringsMICRON TECHNOLOGY INC·Filed 1992·Granted Nov 9, 1993·108 cites·20 claims
- 1095US5372973AMethod to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technologyMICRON TECHNOLOGY INC·Filed 1993·Granted Dec 13, 1994·192 cites·20 claims
- 1194US6599666B2Multi-layer, attenuated phase-shifting maskMICRON TECHNOLOGY INC·Filed 2001·Granted Jul 29, 2003·43 cites·21 claims
- 1294US5786027AMethod for depositing polysilicon with discontinuous grain boundariesMICRON TECHNOLOGY INC·Filed 1997·Granted Jul 28, 1998·133 cites·24 claims
- 1394US5653619AMethod to form self-aligned gate structures and focus ringsMICRON TECHNOLOGY INC·Filed 1994·Granted Aug 5, 1997·80 cites·15 claims
- 1493US5789030AMethod for depositing doped amorphous or polycrystalline silicon on a substrateMICRON TECHNOLOGY INC·Filed 1996·Granted Aug 4, 1998·141 cites·25 claims
- 1593US5376483AMethod of making masks for phase shifting lithographyMICRON SEMICONDUCTOR INC·Filed 1993·Granted Dec 27, 1994·81 cites·18 claims
- 1692US5707485AMethod and apparatus for facilitating removal of material from the backside of wafers via a plasma etchMICRON TECHNOLOGY INC·Filed 1995·Granted Jan 13, 1998·88 cites·16 claims
- 1791US5786116AAtom lithographic mask having diffraction grating aligned with primary mask patternMICRON TECHNOLOGY INC·Filed 1997·Granted Jul 28, 1998·82 cites·36 claims
- 1890US5766829AMethod of phase shift lithographyMICRON TECHNOLOGY INC·Filed 1995·Granted Jun 16, 1998·81 cites·16 claims
- 1990US5468578AMethod of making masks for phase shifting lithography to avoid phase conflictsMICRON TECHNOLOGY INC·Filed 1994·Granted Nov 21, 1995·55 cites·19 claims
- 2090US5194346AMethod of fabricating phase shifting reticles with an accurate phase shift layerMICRON TECHNOLOGY INC·Filed 1991·Granted Mar 16, 1993·66 cites·16 claims
- 2189US8822108B2Reticles with subdivided blocking regionsMICRON TECHNOLOGY INC·Filed 2013·Granted Sep 2, 2014·4 cites·14 claims
- 2289US6211033B1Integrated capacitor bottom electrode for use with conformal dielectricMICRON TECHNOLOGY INC·Filed 1997·Granted Apr 3, 2001·56 cites·26 claims
- 2388US5194345AMethod of fabricating phase shift reticlesMICRON TECHNOLOGY INC·Filed 1991·Granted Mar 16, 1993·59 cites·19 claims
- 2487US6908715B2Multi-layer, attenuated phase-shifting maskMICRON TECHNOLOGY INC·Filed 2003·Granted Jun 21, 2005·18 cites·19 claims
- 2587US6275292B1Reflectance method for evaluating the surface characteristics of opaque materialsMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 14, 2001·23 cites·14 claims
- 2687US5438240AField emission structures produced on macro-grain polysilicon substratesMICRON TECHNOLOGY INC·Filed 1994·Granted Aug 1, 1995·41 cites·20 claims
- 2787US5275237ALiquid filled hot plate for precise temperature controlMICRON TECHNOLOGY INC·Filed 1992·Granted Jan 4, 1994·116 cites·2 claims
- 2886US5576126APhase shifting maskMICRON TECHNOLOGY INC·Filed 1995·Granted Nov 19, 1996·52 cites·21 claims
- 2986US5567644AMethod of making a resistorMICRON TECHNOLOGY INC·Filed 1995·Granted Oct 22, 1996·50 cites·22 claims
- 3086US5487962AMethod of chromeless phase shift mask fabrication suitable for auto-cad layoutFiled 1994·Granted Jan 30, 1996·49 cites·20 claims
- 3186US5240796AMethod of fabricating a chromeless phase shift reticleMICRON TECHNOLOGY INC·Filed 1991·Granted Aug 31, 1993·47 cites·19 claims
- 3286US5194344AMethod of fabricating phase shift reticles including chemically mechanically planarizingMICRON TECHNOLOGY INC·Filed 1991·Granted Mar 16, 1993·48 cites·18 claims
- 3385US7226708B2Multi-layer, attenuated phase-shifting maskMICRON TECHNOLOGY INC·Filed 2005·Granted Jun 5, 2007·5 cites·19 claims
- 3485US5672450AMethod of phase shift mask fabrication comprising a tapered edge and phase conflict resolutionMICRON TECHNOLOGY INC·Filed 1996·Granted Sep 30, 1997·58 cites·27 claims
- 3584US7767365B2Methods for forming and cleaning photolithography reticlesMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 3, 2010·7 cites·51 claims
- 3684US5709754AMethod and apparatus for removing photoresist using UV and ozone/oxygen mixtureMICRON TECHNOLOGY INC·Filed 1995·Granted Jan 20, 1998·68 cites·14 claims
- 3783US6255228B1Method for removing contaminants from a semiconductor waferMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 3, 2001·23 cites·6 claims
- 3883US6114254AMethod for removing contaminants from a semiconductor waferMICRON TECHNOLOGY INC·Filed 1996·Granted Sep 5, 2000·52 cites·15 claims
- 3983US5825498AUltraviolet light reflectance method for evaluating the surface characteristics of opaque materialsMICRON TECHNOLOGY INC·Filed 1996·Granted Oct 20, 1998·54 cites·63 claims
- 4082US5667918AMethod of lithography using reticle pattern blindersMICRON TECHNOLOGY INC·Filed 1995·Granted Sep 16, 1997·60 cites·24 claims
- 4181US6451504B2Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitrideMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 17, 2002·19 cites·4 claims
- 4280US5225035AMethod of fabricating a phase-shifting photolithographic mask reticle having identical light transmittance in all transparent regionsMICRON TECHNOLOGY INC·Filed 1992·Granted Jul 6, 1993·52 cites·9 claims
- 4378US6506689B2Method for removing contaminants from a semiconductor waferMICRON TECHNOLOGY INC·Filed 2001·Granted Jan 14, 2003·16 cites·2 claims
- 4478US6261427B1System for fabricating lithographic stencil masksMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 17, 2001·12 cites·16 claims
- 4578US5372901ARemovable bandpass filter for microlithographic alignersMICRON TECHNOLOGY INC·Filed 1992·Granted Dec 13, 1994·31 cites·20 claims
- 4676US5804336AMethod of forming opaque border on semiconductor photomaskMICRON TECHNOLOGY INC·Filed 1996·Granted Sep 8, 1998·35 cites·43 claims
- 4775US6555432B2Integrated capacitor bottom electrode for use with conformal dielectricMICRON TECHNOLOGY INC·Filed 2000·Granted Apr 29, 2003·14 cites·35 claims
- 4874US6328803B2Method and apparatus for controlling rate of pressure change in a vacuum process chamberMICRON TECHNOLOGY INC·Filed 1997·Granted Dec 11, 2001·28 cites·23 claims
- 4974US6181060B1Field emission display with plural dielectric layersMICRON TECHNOLOGY INC·Filed 1998·Granted Jan 30, 2001·22 cites·33 claims
- 5073US6696224B2Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrateMICRON TECHNOLOGY INC·Filed 2002·Granted Feb 24, 2004·12 cites·31 claims
Showing the top 50 of 151 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →