Inventor · disambiguated record
Jaein Ahn
Also filed as: AHN JAEIN
12 granted patents·2 pending applications·7 citations·filing 2018–2021
82Inventor score
Top patents by PatentIndex Score
14 records- 0184US11534888B2Polishing pad with improved fluidity of slurry and process for preparing sameSKC SOLMICS CO LTD·Filed 2019·Granted Dec 27, 2022·2 cites·11 claims
- 0278US10518383B2Porous polyurethane polishing pad and process for preparing a semiconductor device by using the sameSKC CO LTD·Filed 2018·Granted Dec 31, 2019·2 cites·10 claims
- 0378US10513007B2Porous polyurethane polishing pad and process for preparing a semiconductor device by using the sameSKC CO LTD·Filed 2018·Granted Dec 24, 2019·2 cites·9 claims
- 0469US11766759B2Porous polyurethane polishing pad and process for producing the sameSK ENPULSE CO LTD·Filed 2019·Granted Sep 26, 2023·1 cites·14 claims
- 0559US11267098B2Leakage-proof polishing pad and process for preparing the sameSKC SOLMICS CO LTD·Filed 2018·Granted Mar 8, 2022·0 cites·21 claims
- 0648US11628535B2Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing padSKC SOLMICS CO LTD·Filed 2019·Granted Apr 18, 2023·0 cites·17 claims
- 0746US11000935B2Polishing pad that minimizes occurrence of defects and process for preparing the sameSKC SOLMICS CO LTD·Filed 2020·Granted May 11, 2021·0 cites·12 claims
- 0845US12362232B2Polishing pad and method for preparing semiconductor device using the sameSK ENPULSE CO LTD·Filed 2021·Granted Jul 15, 2025·0 cites·15 claims
- 0945US11571783B2Polishing pad having excellent airtightnessSKC SOLMICS CO LTD·Filed 2018·Granted Feb 7, 2023·0 cites·9 claims
- 1043US2021162560A1Polishing pad, preparation method thereof, and preparation method of semiconductor device using sameSKC CO LTD·Filed 2020·Application pending·0 cites
- 1143US2021154797A1Polishing pad, preparation method thereof, and preparation method of semiconductor device using sameSKC CO LTD·Filed 2020·Application pending·0 cites
- 1242US12479063B2Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing padENPULSE CO LTD·Filed 2019·Granted Nov 25, 2025·0 cites·9 claims
- 1342US11964360B2Polishing pad comprising window similar in hardness to polishing layerSK ENPULSE CO LTD·Filed 2018·Granted Apr 23, 2024·0 cites·7 claims
- 1441US11772236B2Porous polishing pad and process for producing the same all feesSK ENPULSE CO LTD·Filed 2019·Granted Oct 3, 2023·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →