Inventor · disambiguated record
Jaeyeol Baek
Also filed as: BAEK JAEYEOL
12 granted patents·11 pending applications·4 citations·filing 2016–2024
81Inventor score
Files withSAMSUNG SDI CO LTD23
Top patents by PatentIndex Score
23 records- 0189US11249396B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2020·Granted Feb 15, 2022·2 cites·19 claims
- 0278US12313974B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2023·Granted May 27, 2025·0 cites·8 claims
- 0370US11982943B2Method of forming patterns using resist underlayer compositionSAMSUNG SDI CO LTD·Filed 2022·Granted May 14, 2024·0 cites·15 claims
- 0469US2025130493A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0568US2025068076A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0667US2025216779A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0765US11675271B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Jun 13, 2023·0 cites·8 claims
- 0865US10732504B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Aug 4, 2020·1 cites·10 claims
- 0963US2025053090A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1063US2025053091A1Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1160US10323159B2Organic layer composition and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Jun 18, 2019·1 cites·11 claims
- 1259US11385545B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Jul 12, 2022·0 cites·14 claims
- 1357US2025216776A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1456US2023103089A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1555US2024061338A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 1652US11698587B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Jul 11, 2023·0 cites·11 claims
- 1751US2023288809A1Composition for resist underlayer and pattern formation method using sameSAMSUNG SDI CO LTD·Filed 2021·Application pending·0 cites
- 1850US12130552B2Composition for resist underlayer, and pattern forming method using sameSAMSUNG SDI CO LTD·Filed 2020·Granted Oct 29, 2024·0 cites·14 claims
- 1950US2023384667A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 2050US2025093777A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 2149US11987561B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted May 21, 2024·0 cites·17 claims
- 2237US11493848B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Nov 8, 2022·0 cites·17 claims
- 2332US10663863B2Method of producing layer structure, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted May 26, 2020·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →