Inventor · disambiguated record
James A. Bruce
Also filed as: BRUCE JAMES A · BRUCE JAMES ALLEN
28 granted patents·391 citations·filing 1984–2011
97Inventor score
Top patents by PatentIndex Score
28 records- 0189US6395438B1Method of etch bias proximity correctionIBM·Filed 2001·Granted May 28, 2002·33 cites·20 claims
- 0283US6539321B2Method for edge bias correction of topography-induced linewidth variationIBM·Filed 2001·Granted Mar 25, 2003·22 cites·62 claims
- 0383US4978594AFluorine-containing base layer for multi-layer resist processesIBM·Filed 1988·Granted Dec 18, 1990·39 cites·13 claims
- 0480US6147394AMethod of photolithographically defining three regions with one mask step and self aligned isolation structure formed therebyIBM·Filed 1998·Granted Nov 14, 2000·54 cites·1 claims
- 0578US7257247B2Mask defect analysis systemIBM·Filed 2002·Granted Aug 14, 2007·13 cites·27 claims
- 0678US6577406B2Structure for lithographic focus control featuresIBM·Filed 2002·Granted Jun 10, 2003·16 cites·20 claims
- 0777US7269808B2Design verificationIBM·Filed 2005·Granted Sep 11, 2007·11 cites·17 claims
- 0876US7492941B2Mask defect analysis systemIBM·Filed 2007·Granted Feb 17, 2009·3 cites·23 claims
- 0973US5972570AMethod of photolithographically defining three regions with one mask step and self aligned isolation structure formed therebyIBM·Filed 1997·Granted Oct 26, 1999·38 cites·19 claims
- 1072US7492940B2Mask defect analysis systemIBM·Filed 2007·Granted Feb 17, 2009·2 cites·12 claims
- 1171US5614990AIllumination tailoring system using photochromic filterIBM·Filed 1994·Granted Mar 25, 1997·34 cites·31 claims
- 1268US7562337B2OPC verification using auto-windowed regionsIBM·Filed 2006·Granted Jul 14, 2009·3 cites·19 claims
- 1367US5552718AElectrical test structure and method for space and line measurementIBM·Filed 1995·Granted Sep 3, 1996·29 cites·20 claims
- 1466US8166423B2Photomask design verificationMANSFIELD SCOTT M·Filed 2009·Granted Apr 24, 2012·2 cites·20 claims
- 1565US8619236B2Determining lithographic set point using optical proximity correction verification simulationBRUCE JAMES A·Filed 2010·Granted Dec 31, 2013·1 cites·11 claims
- 1661US6338921B1Mask with linewidth compensation and method of making sameIBM·Filed 2000·Granted Jan 15, 2002·6 cites·52 claims
- 1760US8219964B2Method for creating electrically testable patternsBRUCE JAMES A·Filed 2010·Granted Jul 10, 2012·1 cites·30 claims
- 1856US6766507B2Mask/wafer control structure and algorithm for placementIBM·Filed 2002·Granted Jul 20, 2004·5 cites·6 claims
- 1955US6215190B1Borderless contact to diffusion with respect to gate conductor and methods for fabricatingIBM·Filed 1998·Granted Apr 10, 2001·18 cites·7 claims
- 2054US5760483AMethod for improving visibility of alignment targets in semiconductor processingIBM·Filed 1996·Granted Jun 2, 1998·16 cites·10 claims
- 2145US6395624B1Method for forming implants in semiconductor fabricationIBM·Filed 1999·Granted May 28, 2002·11 cites·18 claims
- 2243US8499260B2Optical proximity correction verification accounting for mask deviationsBRUCE JAMES A·Filed 2011·Granted Jul 30, 2013·0 cites·20 claims
- 2343US6300228B1Multiple precipitation doping processIBM·Filed 1999·Granted Oct 9, 2001·9 cites·30 claims
- 2441US8577489B2Diagnosing in-line critical dimension control adjustments using optical proximity correction verificationBRUCE JAMES A·Filed 2011·Granted Nov 5, 2013·0 cites·19 claims
- 2537US6015750AMethod for improving visibility of alignment target in semiconductor processingIBM·Filed 1998·Granted Jan 18, 2000·5 cites·10 claims
- 2636US4612805AAdhesion characterization test siteIBM·Filed 1984·Granted Sep 23, 1986·11 cites·22 claims
- 2735US6303416B1Method to reduce plasma etch flutingIBM·Filed 1999·Granted Oct 16, 2001·8 cites·6 claims
- 2833US6369397B1SPM base focal plane positioningIBM·Filed 1999·Granted Apr 9, 2002·1 cites·16 claims
Join the waitlist — get patent alerts
Get an alert when James A. Bruce files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →