Inventor · disambiguated record
James F. Cameron
Also filed as: CAMERON JAMES · CAMERON JAMES F · CAMERON JAMES FIELD
88 granted patents·23 pending applications·952 citations·filing 1992–2024
99Inventor score
Files withROHM & HAAS ELECT MAT76SHIPLEY CO LLC22CAMERON JAMES F3JOLLA CANCER RES FOUND2STANFORD RES INST INT2
Top patents by PatentIndex Score
111 records- 0197US5466861ABridged bicyclic aromatic compounds and their use in modulating gene expression of retinoid receptorsSTANFORD RES INST INT·Filed 1992·Granted Nov 14, 1995·168 cites·23 claims
- 0296US9442377B1Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 13, 2016·19 cites·14 claims
- 0396US8945814B2Acid generators and photoresists comprising sameROHM & HAAS ELECT MAT·Filed 2013·Granted Feb 3, 2015·10 cites·9 claims
- 0495US10495968B2Iodine-containing polymers for chemically amplified resist compositionsROHM & HAAS ELECT MAT·Filed 2017·Granted Dec 3, 2019·11 cites·14 claims
- 0595US10031420B2Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2016·Granted Jul 24, 2018·13 cites·14 claims
- 0695US8932797B2Photoacid generatorsTHACKERAY JAMES W·Filed 2011·Granted Jan 13, 2015·17 cites·18 claims
- 0793US5731364APhotoimageable compositions comprising multiple arylsulfonium photoactive compoundsSHIPLEY CO LLC·Filed 1996·Granted Mar 24, 1998·70 cites·24 claims
- 0889US5545509APhotoresist composition with photosensitive base generatorIBM·Filed 1994·Granted Aug 13, 1996·63 cites·7 claims
- 0988US11042093B2Gap-filling methodROHM & HAAS ELECT MAT·Filed 2018·Granted Jun 22, 2021·2 cites·10 claims
- 1088US10114288B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Oct 30, 2018·3 cites·16 claims
- 1188US10042251B2Zwitterionic photo-destroyable quenchersROHM & HAAS ELECT MAT·Filed 2016·Granted Aug 7, 2018·5 cites·17 claims
- 1288US9708493B2Coating compositions suitable for use with an overcoated photoresistROHM & HAAS ELECT MAT·Filed 2014·Granted Jul 18, 2017·6 cites·6 claims
- 1388US8900792B2Polymerizable photoacid generatorsTHACKERAY JAMES W·Filed 2011·Granted Dec 2, 2014·6 cites·10 claims
- 1487US7582412B2Multilayer photoresist systemsROHM & HAAS ELECT MAT·Filed 2003·Granted Sep 1, 2009·28 cites·3 claims
- 1587US6849374B2Photoacid generators and photoresists comprising sameSHIPLEY CO LLC·Filed 2001·Granted Feb 1, 2005·70 cites·15 claims
- 1687US6200728B1Photoresist compositions comprising blends of photoacid generatorsSHIPLEY CO LLC·Filed 1999·Granted Mar 13, 2001·51 cites·109 claims
- 1786US9557642B2Photoresist composition and associated method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2015·Granted Jan 31, 2017·5 cites·7 claims
- 1886US8940472B2Coating compositions suitable for use with an overcoated photoresistCAMERON JAMES F·Filed 2010·Granted Jan 27, 2015·4 cites·14 claims
- 1986US6048672APhotoresist compositions and methods and articles of manufacture comprising sameSHIPLEY CO LLC·Filed 1998·Granted Apr 11, 2000·61 cites·19 claims
- 2085US6203965B1Photoresist comprising blends of photoacid generatorsSHIPLEY CO LLC·Filed 2000·Granted Mar 20, 2001·19 cites·4 claims
- 2183US7297616B2Methods, photoresists and substrates for ion-implant lithographyROHM & HAAS ELECT MAT·Filed 2004·Granted Nov 20, 2007·18 cites·6 claims
- 2283US6482567B1Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising sameSHIPLEY CO LLC·Filed 2000·Granted Nov 19, 2002·22 cites·14 claims
- 2382US10901316B2Iodine-containing polymers for chemically amplified resist compositionsROHM & HAAS ELECT MAT·Filed 2019·Granted Jan 26, 2021·2 cites·10 claims
- 2482US8883407B2Coating compositions suitable for use with an overcoated photoresistAMARA JOHN P·Filed 2010·Granted Nov 11, 2014·6 cites·4 claims
- 2581US12287576B2Underlayer compositions and patterning methodsDUPONT ELECTRONIC MAT INTERNATIONAL LLC·Filed 2024·Granted Apr 29, 2025·0 cites·20 claims
- 2680US10790146B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2017·Granted Sep 29, 2020·3 cites·14 claims
- 2780US9581901B2Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2014·Granted Feb 28, 2017·2 cites·16 claims
- 2880US9551930B2Photoresist composition and associated method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2015·Granted Jan 24, 2017·3 cites·6 claims
- 2979US10248020B2Acid generators and photoresists comprising sameROHM & HAAS ELECT MAT·Filed 2012·Granted Apr 2, 2019·3 cites·16 claims
- 3079US6858379B2Photoresist compositions for short wavelength imagingSHIPLEY CO LLC·Filed 2002·Granted Feb 22, 2005·16 cites·8 claims
- 3178US11947258B2Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist compositionROHM & HAAS ELECT MAT·Filed 2023·Granted Apr 2, 2024·0 cites·20 claims
- 3278US10539873B2Coating compositions suitable for use with an overcoated photoresistROHM & HAAS ELECT MAT·Filed 2015·Granted Jan 21, 2020·1 cites·9 claims
- 3378US10007184B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Jun 26, 2018·1 cites·10 claims
- 3478US9182669B2Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2014·Granted Nov 10, 2015·2 cites·10 claims
- 3578US6803169B2Photoresist compositions comprising blends of photoacid generatorsSHIPLEY CO LLC·Filed 2001·Granted Oct 12, 2004·12 cites·26 claims
- 3678US5552271ARXR homodimer formationJOLLA CANCER RES FOUND·Filed 1992·Granted Sep 3, 1996·15 cites·4 claims
- 3777US6037107APhotoresist compositionsSHIPLEY CO LLC·Filed 1997·Granted Mar 14, 2000·30 cites·15 claims
- 3876US11960206B2Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic deviceROHM & HAAS ELECT MAT·Filed 2022·Granted Apr 16, 2024·0 cites·11 claims
- 3974US11613519B2Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist compositionROHM & HAAS ELECT MAT·Filed 2016·Granted Mar 28, 2023·1 cites·15 claims
- 4074US9527936B2Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming methodROHM & HAAS ELECT MAT·Filed 2015·Granted Dec 27, 2016·2 cites·7 claims
- 4173US10527935B2Radiation-sensitive compositions and patterning and metallization processesROHM & HAAS ELECT MAT·Filed 2017·Granted Jan 7, 2020·2 cites·11 claims
- 4273US7326518B2Photoresist compositionsROHM & HAAS ELECT MAT·Filed 2005·Granted Feb 5, 2008·3 cites·15 claims
- 4373US6300035B1Chemically amplified positive photoresistsSHIPLEY CO LLC·Filed 1998·Granted Oct 9, 2001·28 cites·20 claims
- 4471US10894848B2Polyarylene resinsROHM & HAAS ELECT MAT·Filed 2017·Granted Jan 19, 2021·2 cites·10 claims
- 4571US10886119B2Aromatic underlayerROHM & HAAS ELECT MAT·Filed 2019·Granted Jan 5, 2021·1 cites·11 claims
- 4671US6783912B2Photoacid generators and photoresists comprising sameSHIPLEY CO LLC·Filed 2001·Granted Aug 31, 2004·11 cites·22 claims
- 4771US6664022B1Photoacid generators and photoresists comprising sameSHIPLEY CO LLC·Filed 2000·Granted Dec 16, 2003·27 cites·26 claims
- 4870US10509315B2Photoacid generatorROHM & HAAS ELECT MAT·Filed 2019·Granted Dec 17, 2019·0 cites·20 claims
- 4970US2022066321A1Underlayer compositions and patterning methodsROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 5069US11733609B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2021·Granted Aug 22, 2023·0 cites·13 claims
Showing the top 50 of 111 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →