Inventor · disambiguated record
Jacky Huang
Also filed as: HUANG JACKY · HUANG JACKY KUAN-CHIH
8 granted patents·2 pending applications·32 citations·filing 2005–2015
83Inventor score
Top patents by PatentIndex Score
10 records- 0189US9151853B2Neutron-detecting apparatuses and methods of fabricationRENSSELAER POLYTECH INST·Filed 2013·Granted Oct 6, 2015·10 cites·9 claims
- 0287US9406833B2Neutron-detecting apparatuses and methods of fabricationRENSSELAER POLYTECH INST·Filed 2015·Granted Aug 2, 2016·4 cites·11 claims
- 0384US7732109B2Method and system for improving critical dimension uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 8, 2010·6 cites·21 claims
- 0482US7580129B2Method and system for improving accuracy of critical dimension metrologyTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Aug 25, 2009·8 cites·20 claims
- 0569US8027529B2System for improving critical dimension uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Sep 27, 2011·1 cites·13 claims
- 0665US7349086B2Systems and methods for optical measurementTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Mar 25, 2008·1 cites·22 claims
- 0763US7787685B2Extracting ordinary and extraordinary optical characteristics for critical dimension measurement of anisotropic materialsTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Aug 31, 2010·2 cites·18 claims
- 0846US7777884B2Method and system for optimizing sub-nanometer critical dimension using pitch offsetTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Aug 17, 2010·0 cites·15 claims
- 0944US2008233487A1Method and System for Optimizing Lithography Focus and/or Energy Using a Specially-Designed Optical Critical Dimension PatternTAIWAN SEMICONDUCTOR MFG·Filed 2007·Application pending·0 cites
- 1036US2006222975A1Integrated optical metrology and lithographic process track for dynamic critical dimension controlTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →