Inventor · disambiguated record
James M. Lewis
Also filed as: LEWIS JAMES M · LEWIS JAMES MARVIN · WAINER EUGENE
14 granted patents·175 citations·filing 1973–1988
93Inventor score
Top patents by PatentIndex Score
14 records- 0176US4931380APre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresistMICROSI INC·Filed 1988·Granted Jun 5, 1990·29 cites·7 claims
- 0274US4526856ALow striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solventsALLIED CORP·Filed 1983·Granted Jul 2, 1985·25 cites·18 claims
- 0366US3944421AProcess for simultaneous development and etch of photoresist and substrateHORIZONS INC·Filed 1973·Granted Mar 16, 1976·15 cites·4 claims
- 0464US4613561AMethod of high contrast positive O-quinone diazide photoresist developing using pretreatment solutionLEWIS JAMES MARVIN·Filed 1984·Granted Sep 23, 1986·19 cites·7 claims
- 0556US4710449AHigh contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactantsPETRARCH SYSTEMS INC·Filed 1986·Granted Dec 1, 1987·12 cites·30 claims
- 0655US3954468ARadiation process for producing colored photopolymer systemsHORIZONS INC·Filed 1974·Granted May 4, 1976·13 cites·8 claims
- 0753US4278753APlasma developable photoresist composition with polyvinyl formal binderHORIZONS RESEARCH INC·Filed 1980·Granted Jul 14, 1981·15 cites·20 claims
- 0850US4187105APhotosensitive image forming composition containing at least one substituted bis-diaryl vinylidene compound and/or at least one substituted bis-diaryl imine compoundHORIZONS RESEARCH INC·Filed 1978·Granted Feb 5, 1980·4 cites·22 claims
- 0949US4824769AHigh contrast photoresist developerPETRARCH SYSTEMS INC·Filed 1987·Granted Apr 25, 1989·9 cites·5 claims
- 1047US4670372AProcess of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactantPETRARCH SYSTEMS INC·Filed 1984·Granted Jun 2, 1987·9 cites·4 claims
- 1146US4822722AProcess of using high contrast photoresist developer with enhanced sensitivity to form positive resist imagePETRARCH SYSTEMS INC·Filed 1987·Granted Apr 18, 1989·9 cites·4 claims
- 1240US4033773ARadiation produced colored photopolymer systemsHORIZONS INC·Filed 1976·Granted Jul 5, 1977·7 cites·7 claims
- 1339US4661436AProcess of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactantPETRARCH SYSTEM INC·Filed 1985·Granted Apr 28, 1987·7 cites·6 claims
- 1428US4021242ANegative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereofHORIZONS INC·Filed 1975·Granted May 3, 1977·2 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →