Inventor · disambiguated record
Jae Hwan Sim
Also filed as: SIM JAE-HWAN
15 granted patents·3 pending applications·6 citations·filing 2014–2021
84Inventor score
Top patents by PatentIndex Score
18 records- 0180US10527942B2Coating compositions for use with an overcoated photoresistROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2016·Granted Jan 7, 2020·3 cites·7 claims
- 0275US9324604B2Gap-fill methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Apr 26, 2016·3 cites·10 claims
- 0365US11500291B2Underlying coating compositions for use with photoresistsROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2017·Granted Nov 15, 2022·0 cites·19 claims
- 0464US12393118B2Composition for photoresist underlayerROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2021·Granted Aug 19, 2025·0 cites·15 claims
- 0561US12055854B2Coating composition for photoresist underlayerROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2020·Granted Aug 6, 2024·0 cites·20 claims
- 0660US11567409B2Polymers, underlayer coating compositions comprising the same, and patterning methodsROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2020·Granted Jan 31, 2023·0 cites·18 claims
- 0750US11567408B2Coating composition for use with an overcoated photoresistROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2019·Granted Jan 31, 2023·0 cites·15 claims
- 0849US11493845B2Organic bottom antireflective coating composition for nanolithographyROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2014·Granted Nov 8, 2022·0 cites·10 claims
- 0949US11086220B2Underlayer coating compositions for use with photoresistsROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2017·Granted Aug 10, 2021·0 cites·11 claims
- 1047US2021200081A1Pattern formation methodsROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 1146US11269252B2Method for forming pattern using antireflective coating composition including photoacid generatorROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2019·Granted Mar 8, 2022·0 cites·32 claims
- 1246US9558987B2Gap-fill methodsROHM & HAAS ELECT MAT·Filed 2014·Granted Jan 31, 2017·0 cites·18 claims
- 1339US11262656B2Coating compositions for use with an overcoated photoresistROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2016·Granted Mar 1, 2022·0 cites·20 claims
- 1439US10203602B2Coating compositions for use with an overcoated photoresistROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2016·Granted Feb 12, 2019·0 cites·20 claims
- 1538US12228858B2Coating composition for forming resist underlayer film for EUV lithography processROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2018·Granted Feb 18, 2025·0 cites·11 claims
- 1638US10788751B2Coating composition for use with an overcoated photoresistROHM & HAAS ELECT MAT·Filed 2016·Granted Sep 29, 2020·0 cites·13 claims
- 1733US2018364575A1Coating compositions for use with an overcoated photoresistROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2017·Application pending·0 cites
- 1833US2018364576A1Coating compositions for use with an overcoated photoresistROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →