Inventor · disambiguated record
Jacek G. Smolinski
Also filed as: SMOLINSKI JACEK · SMOLINSKI JACEK G · SMOLINSKI JACEK GRZEGORZ
15 granted patents·589 citations·filing 1997–2010
94Inventor score
Top patents by PatentIndex Score
15 records- 0198US7434185B2Method and apparatus for parallel data preparation and processing of integrated circuit graphical design dataIBM·Filed 2006·Granted Oct 7, 2008·203 cites·10 claims
- 0296US6190836B1Methods for repair of photomasksIBM·Filed 2000·Granted Feb 20, 2001·75 cites·18 claims
- 0392US6165649AMethods for repair of photomasksIBM·Filed 1997·Granted Dec 26, 2000·70 cites·64 claims
- 0492US6090507AMethods for repair of photomasksIBM·Filed 1999·Granted Jul 18, 2000·76 cites·18 claims
- 0588US6156461AMethod for repair of photomasksIBM·Filed 2000·Granted Dec 5, 2000·26 cites·11 claims
- 0677US7269808B2Design verificationIBM·Filed 2005·Granted Sep 11, 2007·11 cites·17 claims
- 0773US5978501AAdaptive inspection method and systemIBM·Filed 1997·Granted Nov 2, 1999·64 cites·18 claims
- 0868US7562337B2OPC verification using auto-windowed regionsIBM·Filed 2006·Granted Jul 14, 2009·3 cites·19 claims
- 0965US8619236B2Determining lithographic set point using optical proximity correction verification simulationBRUCE JAMES A·Filed 2010·Granted Dec 31, 2013·1 cites·11 claims
- 1060US8219964B2Method for creating electrically testable patternsBRUCE JAMES A·Filed 2010·Granted Jul 10, 2012·1 cites·30 claims
- 1154US6654488B1Fill pattern inspectionIBM·Filed 1999·Granted Nov 25, 2003·27 cites·9 claims
- 1251US6180953B1Cut and blast defect to avoid chrome roll over annealingIBM·Filed 1998·Granted Jan 30, 2001·10 cites·6 claims
- 1349US6048649AProgrammed defect mask with defects smaller than 0.1 μmIBM·Filed 1998·Granted Apr 11, 2000·15 cites·31 claims
- 1441US6074571ACut and blast defect to avoid chrome roll over annealingIBM·Filed 1997·Granted Jun 13, 2000·5 cites·4 claims
- 1534US6030730APhotomask repaired from black dot defectIBM·Filed 1998·Granted Feb 29, 2000·2 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →