Inventor · disambiguated record
Jai-Hyung Won
Also filed as: WON JAI-HYUNG
4 granted patents·6 pending applications·13 citations·filing 2002–2015
69Inventor score
Top patents by PatentIndex Score
10 records- 0179US9791855B2Semiconductor process management system, semiconductor manufacturing system including the same, and method of manufacturing semiconductorSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Oct 17, 2017·2 cites·20 claims
- 0262US6573180B2PECVD method of forming a tungsten silicide layer on a polysilicon layerSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jun 3, 2003·8 cites·23 claims
- 0360US7170070B2Ion implanters having an arc chamber that affects ion current densitySAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jan 30, 2007·1 cites·21 claims
- 0454US2015129132A1Showerhead and apparatus for processing a substrate including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 0546US7109132B2High density plasma chemical vapor deposition processSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Sep 19, 2006·2 cites·12 claims
- 0641US2007087584A1Plasma doping method and plasma doping apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 0741US2007114436A1Filament member, ion source, and ion implantation apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 0840US2007077366A1Plasma doping method and plasma doping apparatus for performing the sameKEUM GYEONG-SU·Filed 2006·Application pending·0 cites
- 0938US2005087139A1Antenna for use in producing plasma and plasma processing apparatus comprising the sameFiled 2004·Application pending·0 cites
- 1036US2012276743A1Methods of forming a carbon type hard mask layer using induced coupled plasma and methods of forming patterns using the sameWON JAI-HYUNG·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →