Inventor · disambiguated record
Jenq-Tain Lin
Also filed as: LIN JENQ-TAIN
12 granted patents·68 citations·filing 1998–2008
89Inventor score
Files withNIPPON MEKTRON KK12
Top patents by PatentIndex Score
12 records- 0173US6096850APolyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 1999·Granted Aug 1, 2000·25 cites·11 claims
- 0268US6770733B2Polyimide copolymerNIPPON MEKTRON KK·Filed 2003·Granted Aug 3, 2004·9 cites·5 claims
- 0364US7763321B2Polyimide copolymer and metal laminate using the sameNIPPON MEKTRON KK·Filed 2008·Granted Jul 27, 2010·0 cites·1 claims
- 0460US6489436B1Polyimide copolymer and metal laminate using the sameNIPPON MEKTRON KK·Filed 2000·Granted Dec 3, 2002·8 cites·11 claims
- 0555US6582885B2Polyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 2001·Granted Jun 24, 2003·2 cites·9 claims
- 0648US6077924APolyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 1999·Granted Jun 20, 2000·9 cites·13 claims
- 0743US7459216B2Polyimide copolymer and metal laminate using the sameNIPPON MEKTRON KK·Filed 2004·Granted Dec 2, 2008·1 cites·5 claims
- 0841US6232039B1Photosensitive compositionNIPPON MEKTRON KK·Filed 2000·Granted May 15, 2001·4 cites·6 claims
- 0939US6245484B1Polymides, process for producing the same and photosensitive composition the sameNIPPON MEKTRON KK·Filed 2000·Granted Jun 12, 2001·3 cites·3 claims
- 1035US6365324B1Photosensitive compositionNIPPON MEKTRON KK·Filed 1999·Granted Apr 2, 2002·3 cites·4 claims
- 1129US6486290B1Polyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 1999·Granted Nov 26, 2002·0 cites·4 claims
- 1228US5986038AAdhesive compositionNIPPON MEKTRON KK·Filed 1998·Granted Nov 16, 1999·4 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →