Inventor · disambiguated record
Jeffrey W. Neuner
Also filed as: NEUNER JEFFREY W
11 granted patents·6 pending applications·1,582 citations·filing 2002–2010
93Inventor score
Top patents by PatentIndex Score
17 records- 0198US7475588B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Jan 13, 2009·474 cites·64 claims
- 0298US7296460B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Nov 20, 2007·481 cites·23 claims
- 0398US7080545B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2002·Granted Jul 25, 2006·495 cites·81 claims
- 0488US8603252B2Cleaning of semiconductor processing systemsDIMEO FRANK·Filed 2007·Granted Dec 10, 2013·21 cites·6 claims
- 0583US7819981B2Methods for cleaning ion implanter componentsADVANCED TECH MATERIALS·Filed 2004·Granted Oct 26, 2010·16 cites·39 claims
- 0682US7296458B2Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using sameADVANCED TECH MATERIALS·Filed 2004·Granted Nov 20, 2007·21 cites·38 claims
- 0782US7228724B2Apparatus and process for sensing target gas species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2004·Granted Jun 12, 2007·19 cites·41 claims
- 0880US7370511B1Gas sensor with attenuated drift characteristicMST TECHNOLOGY GMBH·Filed 2004·Granted May 13, 2008·18 cites·50 claims
- 0978US8109130B2Apparatus and process for sensing fluoro species in semiconductor processing systemsDIMEO JR FRANK·Filed 2009·Granted Feb 7, 2012·8 cites·22 claims
- 1078US7655887B2Feedback control system and method for maintaining constant resistance operation of electrically heated elementsADVANCED TECH MATERIALS·Filed 2006·Granted Feb 2, 2010·6 cites·19 claims
- 1178US7193187B2Feedback control system and method for maintaining constant resistance operation of electrically heated elementsADVANCED TECH MATERIALS·Filed 2004·Granted Mar 20, 2007·23 cites·22 claims
- 1253US2009095713A1Novel methods for cleaning ion implanter componentsADVANCED TECH MATERIALS·Filed 2005·Application pending·0 cites
- 1350US2010139369A1Feedback control system and method for maintaining constant resistance operation of electrically heated elementsADVANCED TECH MATERIALS·Filed 2010·Application pending·0 cites
- 1449US2008134757A1Method And Apparatus For Monitoring Plasma Conditions In An Etching Plasma Processing FacilityADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1546US2006211253A1Method and apparatus for monitoring plasma conditions in an etching plasma processing facilityCHEN ING-SHIN·Filed 2005·Application pending·0 cites
- 1644US2008251104A1Systems and Methods for Determination of Endpoint of Chamber Cleaning ProcessesADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1740US2004163445A1Apparatus and process for sensing fluoro species in semiconductor processing systemsFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →