Inventor · disambiguated record
Jhih Jheng Ke
Also filed as: KE JHIH JHENG
3 granted patents·2 pending applications·0 citations·filing 2018–2023
39Inventor score
Files withBASF SE5
Top patents by PatentIndex Score
5 records- 0164US12331239B2Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobaltBASF SE·Filed 2023·Granted Jun 17, 2025·0 cites·19 claims
- 0247US12024693B2Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiNBASF SE·Filed 2019·Granted Jul 2, 2024·0 cites·15 claims
- 0347US2023340370A1Composition, Its Use And A Process For Removing Post-Etch ResiduesBASF SE·Filed 2021·Application pending·0 cites
- 0445US2020339523A1Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobaltBASF SE·Filed 2018·Application pending·0 cites
- 0534US11377624B2Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing processBASF SE·Filed 2018·Granted Jul 5, 2022·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →