Inventor · disambiguated record
Ji-Hoon Cha
Also filed as: CHA JI-HOON
31 granted patents·10 pending applications·111 citations·filing 2006–2023
96Inventor score
Top patents by PatentIndex Score
41 records- 0196US9627514B1Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 18, 2017·20 cites·20 claims
- 0291US9728535B2Methods of fabricating semiconductor devices including fin-shaped active regionsYOUN YOUNG-SANG·Filed 2016·Granted Aug 8, 2017·11 cites·18 claims
- 0390US9865597B2Semiconductor device having fin and dual linerSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jan 9, 2018·7 cites·20 claims
- 0489US9305825B2Methods of fabricating semiconductor devices including fin-shaped active regionsSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 5, 2016·7 cites·20 claims
- 0588US9735156B1Semiconductor device and a fabricating method thereofCHA JI-HOON·Filed 2016·Granted Aug 15, 2017·10 cites·20 claims
- 0688US8766343B2Integrated circuit capacitors having sidewall supportsKANG DAE-HYUK·Filed 2012·Granted Jul 1, 2014·10 cites·20 claims
- 0788US8119476B2Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed therebyKANG DAE-HYUK·Filed 2010·Granted Feb 21, 2012·10 cites·16 claims
- 0882US10090190B2Methods of fabricating semiconductor devices including fin-shaped active regionsSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 2, 2018·2 cites·18 claims
- 0980US7560386B2Method of manufacturing nonvolatile semiconductor memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jul 14, 2009·12 cites·24 claims
- 1079US9136135B2Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Sep 15, 2015·4 cites·12 claims
- 1178US7745338B2Method of forming fine pitch hardmask patterns and method of forming fine patterns of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 29, 2010·7 cites·34 claims
- 1276US12042828B2Wafer cleaning apparatus and wafer cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Jul 23, 2024·0 cites·12 claims
- 1375US12362204B2Method of manufacturing semiconductor device using stationary laser moduleSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Jul 15, 2025·0 cites·13 claims
- 1473US11605545B2Wafer cleaning equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Mar 14, 2023·1 cites·20 claims
- 1570US11742221B2Dry cleaning apparatus and dry cleaning methodSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Aug 29, 2023·0 cites·7 claims
- 1670US2023343613A1Multi-chamber apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1768US12100602B2Wet etching apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Sep 24, 2024·0 cites·11 claims
- 1868US8029688B2Method of fine patterning semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Oct 4, 2011·2 cites·25 claims
- 1965US11648594B2Wafer cleaning apparatus and wafer cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 16, 2023·0 cites·8 claims
- 2065US9613811B2Methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 4, 2017·1 cites·17 claims
- 2165US8349200B2Method of fine patterning semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2011·Granted Jan 8, 2013·1 cites·15 claims
- 2264US9040415B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 26, 2015·1 cites·20 claims
- 2364US7700496B2Transistor having a metal nitride layer pattern, etchant and methods of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 20, 2010·2 cites·22 claims
- 2464US2024218297A1Semiconductor cleaning composition and method of manufacturing semiconductor using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2562US12471323B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Nov 11, 2025·0 cites·13 claims
- 2662US11631599B2Semiconductor device manufacturing apparatus including laser moduleSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Apr 18, 2023·0 cites·20 claims
- 2761US11721565B2Multi-chamber apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Aug 8, 2023·0 cites·8 claims
- 2861US10424503B2Methods of fabricating semiconductor devices including fin-shaped active regionsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Sep 24, 2019·0 cites·20 claims
- 2959US9461148B2Semiconductor device and method of fabricating the samePARK JAE-YOUNG·Filed 2013·Granted Oct 4, 2016·1 cites·16 claims
- 3059US8637942B2Transistor having a metal nitride layer pattern, etchant and methods of forming the sameKIM SANG-YONG·Filed 2009·Granted Jan 28, 2014·2 cites·1 claims
- 3158US11087996B2Dry cleaning apparatus and dry cleaning methodSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Aug 10, 2021·0 cites·20 claims
- 3257US2024153792A1Apparatus and method for processing substrateSEMES CO LTD·Filed 2023·Application pending·0 cites
- 3355US2020075359A1Wet etching apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2019·Application pending·0 cites
- 3454US2024055428A1Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 3548US11189503B2Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying systemSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 30, 2021·0 cites·17 claims
- 3648US2006172907A1Microelectronic cleaning agent(s) and method(s) of fabricating semiconductor device(s) using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3748US2008188049A1Methods of Manufacturing Non-Volatile Memory Devices Including Charge-Trapping LayersSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 3841US2014206169A1Methods of Fabricating Semiconductor Device Using Nitridation of Isolation LayersSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 3940US9972683B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted May 15, 2018·0 cites·14 claims
- 4039US2019259641A1Liquid chemical recycle system, liquid chemical supply system, and method of manufacturing semiconductor device using the liquid chemical recycle systemSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 4130US2017053825A1Semiconductor devices having fin field effect transistors with a single liner pattern in a first region and a dual liner pattern in a second region and methods for manufacturing the sameSEO KANG-ILL·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →