Inventor · disambiguated record
Jitendra Kumar Jha
Also filed as: JHA JITENDRA KUMAR
6 granted patents·5 pending applications·3 citations·filing 2020–2024
69Inventor score
Files withINTEL CORP11
Top patents by PatentIndex Score
11 records- 0186US12046654B2Integrated circuit structures including a titanium silicide materialINTEL CORP·Filed 2020·Granted Jul 23, 2024·2 cites·17 claims
- 0280US12119387B2Low resistance approaches for fabricating contacts and the resulting structuresINTEL CORP·Filed 2020·Granted Oct 15, 2024·1 cites·10 claims
- 0371US12402387B2Integrated circuit structures including a titanium silicide materialINTEL CORP·Filed 2024·Granted Aug 26, 2025·0 cites·20 claims
- 0456US12439669B2Co-deposition of titanium and silicon for improved silicon germanium source and drain contactsINTEL CORP·Filed 2021·Granted Oct 7, 2025·0 cites·20 claims
- 0554US11923290B2Halogen treatment for NMOS contact resistance improvementINTEL CORP·Filed 2020·Granted Mar 5, 2024·0 cites·14 claims
- 0652US2024105508A1Integrated circuit devices with contacts using nitridized molybdenumINTEL CORP·Filed 2022·Application pending·0 cites
- 0752US2024006506A1Low-resistance and thermally stable contacts with phosphide or arsenide metal compound layersINTEL CORP·Filed 2022·Application pending·0 cites
- 0851US2024006488A1Capping source and drain regions of transistors to prevent diffusion of dopants during fabricationINTEL CORP·Filed 2022·Application pending·0 cites
- 0950US2024006494A1Source and drain refractory metal capINTEL CORP·Filed 2022·Application pending·0 cites
- 1050US2024006533A1Low-resistance and thermally stable contacts with boride, indium, or gallium metal compound layersINTEL CORP·Filed 2022·Application pending·0 cites
- 1146US12310060B2Gate-all-around integrated circuit structures having uniform threshold voltages and tight gate endcap tolerancesINTEL CORP·Filed 2021·Granted May 20, 2025·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Jitendra Kumar Jha files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →