Inventor · disambiguated record
Jin-A Ryu
Also filed as: RYU JIN · RYU JIN-A
7 granted patents·3 pending applications·29 citations·filing 2003–2022
79Inventor score
Top patents by PatentIndex Score
10 records- 0182US8871423B2Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the sameYUN HYO-JIN·Filed 2011·Granted Oct 28, 2014·6 cites·13 claims
- 0277US6838223B2Compositions for anti-reflective light absorbing layer and method for forming patterns in semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jan 4, 2005·16 cites·30 claims
- 0372US7026497B2Adhesive compound and method for forming photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 11, 2006·3 cites·20 claims
- 0463US2025066935A1Gas diffusion layer for anion exchange membrane electrolysis and manufacturing method thereforHANWHA SOLUTIONS CORP·Filed 2022·Application pending·0 cites
- 0562US9528949B2Methods of detecting inhomogeneity of a layer and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Dec 27, 2016·1 cites·17 claims
- 0649US7964332B2Methods of forming a pattern of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jun 21, 2011·3 cites·15 claims
- 0749US7442489B2Photoresist composition and method of forming a photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 28, 2008·0 cites·16 claims
- 0843US2014014033A1Organic solution supply nozzle and coating apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 0941US2007166644A1Photoresist composition and method of forming a photoresist pattern using the sameKIM BOO-DEUK·Filed 2007·Application pending·0 cites
- 1037US10712662B2Methods of forming patterns using compositions for an underlayer of photoresistSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 14, 2020·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →