Inventor · disambiguated record
Joseph Ferrara
Also filed as: FERRARA JOSEPH · FERRARA JOSEPH F
19 granted patents·4 pending applications·202 citations·filing 2002–2021
94Inventor score
Top patents by PatentIndex Score
23 records- 0191US7949425B2High throughput wafer notch alignerAXCELIS TECH INC·Filed 2006·Granted May 24, 2011·18 cites·37 claims
- 0289US7246985B2Work-piece processing systemAXCELIS TECH INC·Filed 2004·Granted Jul 24, 2007·40 cites·23 claims
- 0387US7750320B2System and method for two-dimensional beam scan across a workpiece of an ion implanterAXCELIS TECH INC·Filed 2006·Granted Jul 6, 2010·10 cites·20 claims
- 0486US7699574B2Work-piece processing systemAXCELIS TECH INC·Filed 2007·Granted Apr 20, 2010·10 cites·25 claims
- 0585US6992309B1Ion beam measurement systems and methods for ion implant dose and uniformity controlAXCELIS TECH INC·Filed 2004·Granted Jan 31, 2006·34 cites·37 claims
- 0684US9378992B2High throughput heated ion implantation system and methodAXCELIS TECH INC·Filed 2014·Granted Jun 28, 2016·7 cites·29 claims
- 0783US6992310B1Scanning systems and methods for providing ions from an ion beam to a workpieceAXCELIS TECH INC·Filed 2004·Granted Jan 31, 2006·18 cites·26 claims
- 0882US7276712B2Method and apparatus for scanning a workpiece in a vacuum chamber of an ion beam implanterAXCELIS TECH INC·Filed 2005·Granted Oct 2, 2007·8 cites·29 claims
- 0980US10041789B2Integrated emissivity sensor alignment characterizationAXCELIS TECH INC·Filed 2016·Granted Aug 7, 2018·3 cites·20 claims
- 1077US11728187B2Method for decreasing cool down time with heated system for semiconductor manufacturing equipmentAXCELIS TECH INC·Filed 2018·Granted Aug 15, 2023·2 cites·16 claims
- 1176US6710360B2Adjustable implantation angle workpiece support structure for an ion beam implanterAXCELIS TECH INC·Filed 2002·Granted Mar 23, 2004·19 cites·31 claims
- 1273US6900444B2Adjustable implantation angle workpiece support structure for an ion beam implanterAXCELIS TECH INC·Filed 2004·Granted May 31, 2005·15 cites·34 claims
- 1367US7112808B2Wafer 2D scan mechanismAXCELIS TECH INC·Filed 2004·Granted Sep 26, 2006·7 cites·21 claims
- 1466US7375355B2Ribbon beam ion implanter cluster toolAXCELIS TECH INC·Filed 2006·Granted May 20, 2008·2 cites·20 claims
- 1565US7172221B1Pipe stabilizing systemFERRARA JOSEPH F·Filed 2005·Granted Feb 6, 2007·6 cites·5 claims
- 1662US2021366746A1Active workpiece heating or cooling for an ion implantation systemAXCELIS TECH INC·Filed 2021·Application pending·0 cites
- 1761US9607803B2High throughput cooled ion implantation system and methodAXCELIS TECH INC·Filed 2015·Granted Mar 28, 2017·1 cites·28 claims
- 1856US11670483B2High power wafer coolingAXCELIS TECH INC·Filed 2020·Granted Jun 6, 2023·0 cites·20 claims
- 1951US10832926B2High throughput serial wafer handling end stationAXCELIS TECH INC·Filed 2016·Granted Nov 10, 2020·0 cites·18 claims
- 2050US2018197761A1Active workpiece heating or cooling for an ion implantation systemAXCELIS TECH INC·Filed 2018·Application pending·0 cites
- 2150US2008138178A1High throughput serial wafer handling end stationAXCELIS TECH INC·Filed 2006·Application pending·0 cites
- 2248US6774373B2Adjustable implantation angle workpiece support structure for an ion beam implanterAXCELIS TECH INC·Filed 2003·Granted Aug 10, 2004·2 cites·28 claims
- 2340US2006017010A1Magnet for scanning ion beamsAXCELIS TECH INC·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →