Inventor · disambiguated record
John K. Lowell
Also filed as: LOWELL JOHN · LOWELL JOHN K
11 granted patents·414 citations·filing 1993–1998
93Inventor score
Files withADVANCED MICRO DEVICES INC11
Top patents by PatentIndex Score
11 records- 0193US5778039AMethod and apparatus for the detection of light elements on the surface of a semiconductor substrate using x-ray fluorescence (XRF)ADVANCED MICRO DEVICES INC·Filed 1996·Granted Jul 7, 1998·141 cites·13 claims
- 0280US5963783AIn-line detection and assessment of net charge in PECVD silicon dioxide (oxide) layersADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 5, 1999·52 cites·11 claims
- 0376US5557409ACharacterization of an external silicon interface using optical second harmonic generationADVANCED MICRO DEVICES INC·Filed 1994·Granted Sep 17, 1996·39 cites·40 claims
- 0474US5657363AMethod and apparatus for determining the thickness and elemental composition of a thin film using radioisotopic X-ray fluorescence (RXRF)ADVANCED MICRO DEVICES INC·Filed 1995·Granted Aug 12, 1997·43 cites·14 claims
- 0568US5581194AMethod and apparatus for passive optical characterization of semiconductor substrates subjected to high energy (MEV) ion implantation using high-injection surface photovoltageADVANCED MICRO DEVICES INC·Filed 1995·Granted Dec 3, 1996·38 cites·7 claims
- 0665US5907764AIn-line detection and assessment of net charge in PECVD silicon dioxide (oxide) layersADVANCED MICRO DEVICES INC·Filed 1995·Granted May 25, 1999·25 cites·10 claims
- 0759US5804981AMethod of detecting heavy metal impurities introduced into a silicon wafer during ion implantationADVANCED MICRO DEVICES INC·Filed 1996·Granted Sep 8, 1998·31 cites·34 claims
- 0854US5471293AMethod and device for determining defects within a crystallographic substrateADVANCED MICRO DEVICES INC·Filed 1994·Granted Nov 28, 1995·19 cites·16 claims
- 0948US5841016AUltra-low level standard for concentration measurementsADVANCED MICRO DEVICES INC·Filed 1996·Granted Nov 24, 1998·14 cites·34 claims
- 1036US5891743AMethod of forming buried oxygen layer using MeV ion implantationADVANCED MICRO DEVICES INC·Filed 1996·Granted Apr 6, 1999·6 cites·7 claims
- 1129US6190518B1Device for reducing plasma etch damage and method for manufacturing sameADVANCED MICRO DEVICES INC·Filed 1993·Granted Feb 20, 2001·6 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →