Inventor · disambiguated record
Jong-Rak Park
Also filed as: PARK JONG-RAK
8 granted patents·83 citations·filing 1998–2015
84Inventor score
Files withSAMSUNG ELECTRONICS CO LTD3INDUSTRY-ACADEMIC COOP FOUND CHOSUN UNIV1KONKUK UNIV GLOCAL IND ACADEMIC COLLABORATION FOUND1KOREA RES INST STANDARDS & SCI1UNIV KONKUK IND COOP CORP1
Top patents by PatentIndex Score
8 records- 0186US7001697B2Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 21, 2006·41 cites·36 claims
- 0276US9523069B2Photobioreactor for microalgae cultivation having arc-type partition structure for forming vorticesINDUSTRY-ACADEMIC COOP FOUND CHOSUN UNIV·Filed 2014·Granted Dec 20, 2016·3 cites·6 claims
- 0357US6911286B2Method of designing phase grating pattern providing modified illumination optimum for producing a target pattern and method of manufacturing a photo mask system comprising the phase grating patternSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 28, 2005·7 cites·20 claims
- 0456US10058712B2Somatic sensation induction system using pulse laser and medium of high absorption coefficientKONKUK UNIV GLOCAL IND ACADEMIC COLLABORATION FOUND·Filed 2015·Granted Aug 28, 2018·1 cites·6 claims
- 0546US6131527AVacuum box for use with overlock sewing machinesFiled 1999·Granted Oct 17, 2000·17 cites·12 claims
- 0644US9092955B2Laser apparatus capable of controlling a photo-mechanical effect and method using the sameUNIV KONKUK IND COOP CORP·Filed 2013·Granted Jul 28, 2015·0 cites·13 claims
- 0743US6064684AUnidirectionally operating laser apparatus using semimonolithic ring cavityKOREA RES INST STANDARDS & SCI·Filed 1998·Granted May 16, 2000·14 cites·5 claims
- 0835US6933083B2Method of designing phase grating pattern for use in modifying illumination in an exposure process, and method of manufacturing a photo mask system having the phase grating patternSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 23, 2005·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →