Inventor · disambiguated record
Jongju Park
Also filed as: PARK JONGJU
11 granted patents·5 pending applications·25 citations·filing 2012–2024
86Inventor score
Top patents by PatentIndex Score
16 records- 0192US11635371B2Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the methodSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Apr 25, 2023·3 cites·16 claims
- 0292US11506968B2Method of annealing reflective photomask by using laserSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Nov 22, 2022·3 cites·20 claims
- 0392US9703186B2Mask including pellicle, pellicle repairing apparatus, and substrate manufacturing equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jul 11, 2017·7 cites·13 claims
- 0483US9466490B2Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Oct 11, 2016·4 cites·20 claims
- 0580US9087698B2Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devicesKIM SANGHYUN·Filed 2013·Granted Jul 21, 2015·5 cites·28 claims
- 0677US11852583B2Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Dec 26, 2023·0 cites·12 claims
- 0775US11934092B2Method of annealing reflective photomask by using laserSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 19, 2024·0 cites·18 claims
- 0875US10762001B2Memory system and operation method thereofSK HYNIX INC·Filed 2018·Granted Sep 1, 2020·2 cites·18 claims
- 0974US2024184192A1Method of annealing reflective photomask by using laserSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1061US2025068050A1Photomask assembly and semiconductor chip manufactured using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1160US8697318B2Method of forming photomasks and photomasks formed by the samePARK JONGJU·Filed 2012·Granted Apr 15, 2014·1 cites·15 claims
- 1259US12313979B2Correcting apparatus of extreme ultraviolet (EUV) photomask and correcting method of EUV photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted May 27, 2025·0 cites·20 claims
- 1352US2023408912A1Method of manufacturing photomask, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1448US12259647B2Method of manufacturing extreme ultraviolet (EUV) photomask and method and apparatus for correcting EUV photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 25, 2025·0 cites·19 claims
- 1542US2021033959A1Extreme ultraviolet photomask manufacturing method and semiconductor device fabrication method including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Application pending·0 cites
- 1631US2017031142A1Apparatus generating extreme ultraviolet light and exposure system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →